⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1924381 | 0.74 | — | — | |
| SCHEMBL1926817 | 0.71 | HPGD (0.32) | — | |
| SCHEMBL1925277 | 0.64 | — | — | |
| SCHEMBL10197346 | 0.58 | INMT (0.30) | — | |
| SCHEMBL12941188 | 0.58 | MAOB (0.31) | — | |
| SCHEMBL11892890 | 0.57 | — | — | |
| SCHEMBL22932843 | 0.55 | KDM4E (0.32) | — | |
| SCHEMBL12018422 | 0.55 | DHFR (0.32) | — | |
| SCHEMBL14174736 | 0.53 | HRH3 (0.33) | — | |
| SCHEMBL19713143 | 0.53 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2330109-B1 | Liquid precursor for depositing group 4 metal containing films | AIR PROD & CHEM (US) | 2013-01-16 | — | — | EP | claimed |
| US-20110135838-A1 | Liquid Precursor for Depositing Group 4 Metal Containing Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-06-09 | — | — | US | claimed |
| EP-2330109-A1 | Liquid precursor for depositing group 4 metal containing films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-06-08 | — | — | EP | claimed |
| CN-102086513-B | Liquid precursor for depositing group 4 metal containing films | AIR PROD & CHEM | 2014-07-30 | — | — | CN | disclosed |
| US-8592606-B2 | Liquid precursor for depositing group 4 metal containing films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-11-26 | — | — | US | disclosed |
| US-8592606-B2 | Liquid precursor for depositing group 4 metal containing films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-11-26 | — | — | US | disclosed |
| EP-2330109-B1 | Liquid precursor for depositing group 4 metal containing films | AIR PROD & CHEM (US) | 2013-01-16 | — | — | EP | disclosed |
| US-20110135838-A1 | Liquid Precursor for Depositing Group 4 Metal Containing Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-06-09 | — | — | US | disclosed |
| US-20110135838-A1 | Liquid Precursor for Depositing Group 4 Metal Containing Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-06-09 | — | — | US | disclosed |
| EP-2330109-A1 | Liquid precursor for depositing group 4 metal containing films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-06-08 | — | — | EP | disclosed |
| EP-2330109-A1 | Liquid precursor for depositing group 4 metal containing films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-06-08 | — | — | EP | disclosed |
| CN-102086513-A | Liquid precursor for depositing group 4 metal containing films | AIR PROD & CHEM | 2011-06-08 | — | — | CN | disclosed |