SCHEMBL19307922

SCHEMBL19307922

CC[C@@H](C)C1(C)c2ccc(/C(C)=N\OC(C)=O)cc2-c2ccc(C(=O)c3ccccc3C)cc21

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 2/20 0.34
▸ NPY1R P25929 1/20 0.34
▸ NPY2R P49146 1/20 0.34
▸ ALDH1A1 P00352 3/20 0.32
▸ HTT P42858 2/20 0.32
▸ PDK2 Q15119 2/20 0.32
▸ CASP3 P42574 1/20 0.32
▸ SENP8 Q96LD8 1/20 0.32
▸ SENP7 Q9BQF6 1/20 0.32
▸ SENP6 Q9GZR1 1/20 0.32
▸ L3MBTL1 Q9Y468 1/20 0.32
▸ MAPK13 O15264 1/20 0.31
▸ MAPK12 P53778 1/20 0.31
▸ MAPK11 Q15759 1/20 0.31
▸ MAPK14 Q16539 1/20 0.31
▸ PPARG P37231 1/20 0.30
▸ PPARA Q07869 1/20 0.30
▸ KMT2A Q03164 3/20 0.30
▸ NPC1 O15118 3/20 0.30
▸ RAB9A P51151 3/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19307923 0.85 ALDH1A1 (0.37) MAPTNPY1RNPY2RALDH1A1HTT
SCHEMBL22236591 0.84 ALDH1A1 (0.33) MAPTALDH1A1HTTPDK2CASP3
SCHEMBL17282533 0.83 ALDH1A1 (0.34) MAPTNPY1RNPY2RALDH1A1HTT
SCHEMBL18852824 0.83 ALDH1A1 (0.39) MAPTNPY1RNPY2RALDH1A1HTT
SCHEMBL29789550 0.80 ALDH1A1 (0.36) MAPTNPY1RNPY2RALDH1A1HTT
SCHEMBL17056227 0.80 ALDH1A1 (0.36) MAPTNPY1RNPY2RALDH1A1HTT
SCHEMBL17877627 0.80 ALDH1A1 (0.36) MAPTNPY1RNPY2RALDH1A1HTT
SCHEMBL17084350 0.80 ALDH1A1 (0.36) MAPTNPY1RNPY2RALDH1A1HTT
SCHEMBL17084334 0.78 MAPK14 (0.36) MAPTALDH1A1HTTPDK2CASP3
SCHEMBL17056226 0.77 ALDH1A1 (0.34) MAPTALDH1A1HTTPDK2CASP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9751984-B2 Polyimide precursor, photosensitive resin composition containing said polyimide precursor, and cured-pattern-film manufacturing method and semiconductor device using said photosensitive resin composition HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) 2017-09-05 — — US disclosed
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