SCHEMBL19307923

SCHEMBL19307923

CC(=O)O/N=C(/C)c1ccc2c(c1)-c1ccc(C(=O)c3ccccc3C)cc1C2(C)C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.37
▸ HTT P42858 1/20 0.37
▸ CASP3 P42574 1/20 0.36
▸ SENP8 Q96LD8 1/20 0.36
▸ SENP7 Q9BQF6 1/20 0.36
▸ SENP6 Q9GZR1 1/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ MAPK13 O15264 1/20 0.35
▸ MAPK12 P53778 1/20 0.35
▸ MAPK11 Q15759 1/20 0.35
▸ MAPK14 Q16539 1/20 0.35
▸ NPC1 O15118 4/20 0.34
▸ RAB9A P51151 4/20 0.34
▸ POLB P06746 2/20 0.34
▸ KMT2A Q03164 1/20 0.34
▸ PDK2 Q15119 6/20 0.33
▸ HTR7 P34969 1/20 0.33
▸ HTR2B P41595 1/20 0.33
▸ XDH P47989 1/20 0.33
▸ HPGD P15428 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18852824 0.96 ALDH1A1 (0.39) ALDH1A1HTTCASP3SENP8SENP7
SCHEMBL22236591 0.86 ALDH1A1 (0.33) ALDH1A1HTTCASP3SENP8SENP7
SCHEMBL17282533 0.85 ALDH1A1 (0.34) ALDH1A1HTTCASP3SENP8SENP7
SCHEMBL19307922 0.85 MAPT (0.34) ALDH1A1HTTCASP3SENP8SENP7
SCHEMBL17056227 0.82 ALDH1A1 (0.36) ALDH1A1HTTCASP3SENP8SENP7
SCHEMBL17084350 0.82 ALDH1A1 (0.36) ALDH1A1HTTCASP3SENP8SENP7
SCHEMBL17084334 0.82 MAPK14 (0.36) ALDH1A1HTTCASP3SENP8SENP7
SCHEMBL17877627 0.82 ALDH1A1 (0.36) ALDH1A1HTTCASP3SENP8SENP7
SCHEMBL29789550 0.82 ALDH1A1 (0.36) ALDH1A1HTTCASP3SENP8SENP7
SCHEMBL17877630 0.82 PDK2 (0.48) ALDH1A1L3MBTL1PDK2HPGDSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10725379-B2 Polymide precursor resin composition HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) 2020-07-28 — — US disclosed
US-10717893-B2 Photosensitive film, photosensitive element, cured product and touch panel HITACHI CHEMICAL COMPANY, LTD. (JP) 2020-07-21 — — US disclosed
US-10040967-B2 Photosensitive film, photosensitive element, cured product and touch panel HITACHI CHEMICAL COMPANY, LTD. (JP) 2018-08-07 — — US disclosed
US-9751984-B2 Polyimide precursor, photosensitive resin composition containing said polyimide precursor, and cured-pattern-film manufacturing method and semiconductor device using said photosensitive resin composition HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) 2017-09-05 — — US disclosed
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