Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 1/20 | 0.38 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.38 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.36 |
| ▸ | CLK1 | P49759 | 1/20 | 0.36 |
| ▸ | CLK2 | P49760 | 1/20 | 0.36 |
| ▸ | DYRK1A | Q13627 | 1/20 | 0.36 |
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.36 |
| ▸ | DYRK1B | Q9Y463 | 1/20 | 0.36 |
| ▸ | MDH1 | P40925 | 1/20 | 0.36 |
| ▸ | MDH2 | P40926 | 1/20 | 0.36 |
| ▸ | DPP8 | Q6V1X1 | 3/20 | 0.34 |
| ▸ | DPP9 | Q86TI2 | 3/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | DPP4 | P27487 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4759735 | 0.87 | CYP17A1 (0.36) | CYP17A1CYP19A1PKMHSD11B1MDH1 | |
| SCHEMBL776275 | 0.87 | CYP17A1 (0.36) | CYP17A1CYP19A1PKMHSD11B1MDH1 | |
| SCHEMBL776064 | 0.87 | CYP17A1 (0.36) | CYP17A1CYP19A1PKMHSD11B1MDH1 | |
| SCHEMBL14231490 | 0.85 | CYP17A1 (0.33) | CYP17A1CYP19A1DPP4 | |
| SCHEMBL19819922 | 0.84 | CYP17A1 (0.35) | CYP17A1CYP19A1PKMHSD11B1MDH1 | |
| SCHEMBL11966898 | 0.84 | HSD11B1 (0.38) | CYP17A1CYP19A1PKMHSD11B1MDH1 | |
| SCHEMBL12131745 | 0.84 | CYP17A1 (0.35) | CYP17A1CYP19A1PKMHSD11B1MDH1 | |
| SCHEMBL13088075 | 0.84 | HSD11B1 (0.38) | CYP17A1CYP19A1PKMHSD11B1MDH1 | |
| SCHEMBL776067 | 0.84 | MDH1 (0.36) | CYP17A1CYP19A1PKMHSD11B1MDH1 | |
| SCHEMBL47540 | 0.84 | HSD11B1 (0.38) | CYP17A1CYP19A1PKMHSD11B1MDH1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11874603-B2 | Photoresist composition comprising amide compound and pattern formation methods using the same | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2024-01-16 | — | — | US | disclosed |
| US-20230099348-A1 | PHOTORESIST COMPOSITION COMPRISING AMIDE COMPOUND AND PATTERN FORMATION METHODS USING THE SAME | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2023-03-30 | — | — | US | disclosed |
| US-20210294214-A1 | UNDERLAYER FILM FORMING COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-09-23 | — | — | US | disclosed |
| US-20190180888-A1 | CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-06-13 | — | — | US | disclosed |
| US-9996002-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-06-12 | — | — | US | disclosed |
| US-9983478-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-05-29 | — | — | US | disclosed |
| US-9971241-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20180113382-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-26 | — | — | US | disclosed |
| US-9951159-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-24 | — | — | US | disclosed |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-03-08 | — | — | US | disclosed |
| US-20160004155-A1 | PHOTO ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-07 | — | — | US | disclosed |
| US-9229321-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-20150168828-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-18 | — | — | US | disclosed |
| US-8956803-B2 | Sulfonium salt, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-17 | — | — | US | disclosed |
| US-8741541-B2 | Compound, resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8206891-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-26 | — | — | US | disclosed |
| US-20100167200-A1 | (Meth)acrylate compound, photosensitive polymer, and resist composition including the same | CHEIL INDUSTRIES, INC. (KR) | 2010-07-01 | — | — | US | disclosed |
| US-20100151388-A1 | (Meth)acrylate compound, photosensitive polymer, and resist composition including the same | CHEIL INDUSTRIES, INC. (KR) | 2010-06-17 | — | — | US | disclosed |
| US-20100086873-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| EP-1939691-A2 | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method | FUJIFILM Corporation (JP) | 2008-07-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180113382-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, FRG1, C1R | CYP17A1 1701/4885CYP19A1 1890/4885PKM 4800/4885 |
| US-20100151388-A1 | (Meth)acrylate compound, photosensitive polymer, and resist composition including the same | MMAB, TET1, MAT1A | CYP17A1 3065/4885CYP19A1 969/4885PKM 1814/4885 |
| US-20100167200-A1 | (Meth)acrylate compound, photosensitive polymer, and resist composition including the same | MMAB, TET1, MGMT | CYP17A1 2739/4885CYP19A1 767/4885PKM 1112/4885 |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1R, RER1, C1S | CYP17A1 2353/4885CYP19A1 1763/4885PKM 3345/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.