SCHEMBL19335545

SCHEMBL19335545

CC(C)(C)c1ccc(C(=O)Oc2ccc3[nH]c(=O)oc3c2)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CREBBP Q92793 1/20 0.55
KMT2A Q03164 7/20 0.52
MAPT P10636 3/20 0.52
MEN1 O00255 3/20 0.52
TDP1 Q9NUW8 2/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
POLB P06746 3/20 0.47
PRSS1 P07477 1/20 0.46
ACR P10323 1/20 0.46
ALDH1A1 P00352 4/20 0.46
KDM4E B2RXH2 2/20 0.46
GBA1 P04062 2/20 0.45
SMN1; SMN2 Q16637 1/20 0.44
THRB P10828 1/20 0.44
NOS1 P29475 1/20 0.43
CA12 O43570 1/20 0.41
CA9 Q16790 1/20 0.41
GLA P06280 1/20 0.41
GAA P10253 1/20 0.41
NPBWR1 P48145 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9610676 0.84 CREBBP (0.56) CREBBPKMT2AMAPTMEN1TDP1
SCHEMBL9610684 0.83 KMT2A (0.59) CREBBPKMT2AMAPTMEN1TDP1
SCHEMBL16187161 0.83 CREBBP (0.55) CREBBPKMT2AMAPTMEN1TDP1
SCHEMBL18785888 0.79 CREBBP (0.52) CREBBPKMT2AMAPTMEN1TDP1
SCHEMBL18457389 0.79 CREBBP (0.51) CREBBPKMT2AMAPTMEN1TDP1
SCHEMBL30186490 0.78 KMT2A (0.74) KMT2AMAPTMEN1TDP1L3MBTL1
SCHEMBL9610690 0.77 CREBBP (0.56) CREBBPKMT2AMAPTMEN1TDP1
SCHEMBL2054650 0.77 NOS1 (0.61) CREBBPKMT2AMAPTMEN1L3MBTL1
SCHEMBL144518 0.76 CREBBP (0.54) CREBBPKMT2AMEN1TDP1POLB
SCHEMBL19400637 0.76 KMT2A (0.61) KMT2AMAPTMEN1TDP1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9829792-B2 Monomer, polymer, positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-11-28 US disclosed
US-9810983-B2 Polymer, chemically amplified positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-11-07 US disclosed
US-9760010-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 US disclosed