SCHEMBL194073

SCHEMBL194073

C=COC(=O)COCCCC

nearest known ligand 0.46

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.46
CES2 O00748 2/20 0.46
HPGD P15428 1/20 0.46
TDP1 Q9NUW8 1/20 0.41
ATM Q13315 1/20 0.39
ALDH1A1 P00352 1/20 0.38
EPHX2 P34913 1/20 0.36
HCAR2 Q8TDS4 1/20 0.35
NAAA Q02083 1/20 0.34
CYP3A4 P08684 1/20 0.34
DGKA P23743 1/20 0.34
PLA2G4B P0C869 2/20 0.34
PLA2G2C Q5R387 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18746205 0.88 TDP1 (0.43) TSHRCES2HPGDTDP1ALDH1A1
SCHEMBL3772207 0.86 TSHR (0.41) TSHRCES2HPGDTDP1ATM
SCHEMBL14827534 0.83 TDP1 (0.44) TSHRTDP1ALDH1A1CYP3A4
SCHEMBL10748288 0.83 TSHR (0.44) TSHRCES2HPGDATMALDH1A1
SCHEMBL7094322 0.82 TDP1 (0.42) TSHRCES2HPGDTDP1ALDH1A1
SCHEMBL8946360 0.81 TDP1 (0.63) TSHRCES2HPGDTDP1ATM
SCHEMBL328720 0.81 ALDH1A1 (0.43) TSHRTDP1ALDH1A1
SCHEMBL5144579 0.81 TDP1 (0.41) TSHRTDP1ALDH1A1
SCHEMBL9439268 0.79
SCHEMBL19506911 0.79 TDP1 (0.38) TSHRTDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 860 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7105270-B2 Fluoroaliphatic group-containing copolymer FUJI PHOTO FILM CO., LTD. (JP) 2006-09-12 US claimed
US-5698361-A DIAZONIUM COMPOUND, POLYMERIC BINDER; DURABILITY FUJI PHOTO FILM CO., LTD. (JP) 1997-12-16 US claimed
US-4396706-A ADDITION INTERPOLYMER PARTICLES, MATTES FUJI PHOTO FILM CO., LTD. (JP) 1983-08-02 US claimed
US-4087574-A PHOTOGRAPHY, VINYL OR VINYLIDENE CHLORIDE POLYMERS FUJI PHOTO FILM CO., LTD. (JA) 1978-05-02 US claimed
CN-120118458-A Curable composition, resin, and cured product 东京应化工业株式会社 2025-06-10 CN disclosed
CN-120044751-A Photosensitive resin composition 东京应化工业株式会社 2025-05-27 CN disclosed
CN-120044752-A Photosensitive resin composition 东京应化工业株式会社 2025-05-27 CN disclosed
US-12312489-B2 Curable composition, cured product and method for forming insulating film TOKYO OHKA KOGYO CO., LTD. (JP) 2025-05-27 US disclosed
CN-119937242-A Photosensitive resin composition 东京应化工业株式会社 2025-05-06 CN disclosed
CN-112394438-B Method for manufacturing color filter, and resin composition 东京应化工业株式会社 2025-01-03 CN disclosed
EP-4114825-B1 OXIME ESTER PHOTOINITIATORS BASF SE (DE) 2024-11-20 EP disclosed
CN-110317174-B Hydrogen barrier agent, composition for forming hydrogen barrier film, method for producing hydrogen barrier film, and electronic device 东京应化工业株式会社 2024-10-22 CN disclosed
US-4087574-A PHOTOGRAPHY, VINYL OR VINYLIDENE CHLORIDE POLYMERS FUJI PHOTO FILM CO., LTD. (JA) 1978-05-02 US disclosed
US-4065435-A OXIDATION-REDUCTION PROPERTIES, ACRYLIC FUJI PHOTO FILM CO., LTD. (JA) 1977-12-27 US disclosed
US-4058443-A PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN FUJI PHOTO FILM CO., LTD. (JA) 1977-11-15 US disclosed
US-4054722-A PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JA) 1977-10-18 US disclosed
US-4050936-A Image forming process with photopolymer layers between a support and a substrate FUJI PHOTO FILM CO., LTD. (JA) 1977-09-27 US disclosed
US-4041017-A Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams FUJI PHOTO FILM CO., LTD. (JA) 1977-08-09 US disclosed
US-3936429-A Reactive polymer FUJI PHOTO FILM CO., LTD. (JA) 1976-02-03 US disclosed
US-3931248-A Reactive high polymer compound FUJI PHOTO FILM CO., LTD. (JA) 1976-01-06 US disclosed