SCHEMBL194141

SCHEMBL194141

C=C(C)C(=O)N(O)c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.43
HPGD P15428 2/20 0.43
NPSR1 Q6W5P4 1/20 0.41
ALDH1A1 P00352 3/20 0.40
GLA P06280 1/20 0.39
TSHR P16473 1/20 0.39
MTNR1A P48039 1/20 0.38
MTNR1B P49286 1/20 0.38
SMN1; SMN2 Q16637 2/20 0.36
MEN1 O00255 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
KMT2A Q03164 1/20 0.36
NPC1 O15118 1/20 0.36
MAPT P10636 1/20 0.36
ALOX15 P16050 1/20 0.36
RAB9A P51151 1/20 0.36
HSD17B10 Q99714 1/20 0.36
ELANE P08246 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7886211 0.82 NPSR1 (0.52) KDM4EHPGDNPSR1ALDH1A1GLA
SCHEMBL195179 0.81 NPSR1 (0.54) KDM4EHPGDNPSR1ALDH1A1GLA
SCHEMBL27483458 0.80 NPSR1 (0.39) KDM4EHPGDNPSR1ALDH1A1GLA
SCHEMBL194085 0.79 HTT (0.46) KDM4ENPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL440963 0.78 KDM4E (0.48) KDM4EHPGDNPSR1ALDH1A1GLA
SCHEMBL22135626 0.78 HPGD (0.40) KDM4EHPGDNPSR1ALDH1A1GLA
SCHEMBL6021862 0.78 CRHBP (0.44) KDM4EHPGDNPSR1ALDH1A1GLA
SCHEMBL2363329 0.78 NPSR1 (0.40) KDM4EHPGDNPSR1ALDH1A1GLA
SCHEMBL3286692 0.76 HTT (0.40) KDM4EHPGDNPSR1ALDH1A1GLA
Water SCHEMBL28741447 0.76 KDM4E (0.47) KDM4EHPGDNPSR1ALDH1A1GLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1532566-B Radiation sensitive composition for color filter JSR CORP 2010-05-12 CN claimed
US-20070099816-A1 Hard Surface Cleaning Composition THE CLOROX COMPANY 2007-05-03 US claimed
CN-117120892-B Polarizer protective film 柯尼卡美能达株式会社 2026-05-15 CN disclosed
CN-115136045-B Optical film, polarizing plate, and organic electroluminescent image display device 柯尼卡美能达株式会社 2024-12-20 CN disclosed
WO-2024248065-A1 POLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME, COPPER PASTE, LIQUID COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING COPPER PILLAR FOR SEMICONDUCTOR CONNECTION 株式会社ダイセル 2024-12-05 WO disclosed
WO-2024248064-A1 POLYMER, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME, COPPER PASTE, LIQUID COMPOSITION, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING COPPER PILLAR FOR SEMICONDUCTOR CONNECTION 株式会社ダイセル 2024-12-05 WO disclosed
WO-2024248066-A1 POLYMER, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME, COPPER PASTE, LIQUID COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING COPPER PILLAR FOR SEMICONDUCTOR CONNECTION 株式会社ダイセル 2024-12-05 WO disclosed
CN-118850881-A Film roll 柯尼卡美能达株式会社 2024-10-29 CN disclosed
CN-118810086-A Optical film manufacturing control system, optical film manufacturing control program, and optical film manufacturing method 柯尼卡美能达株式会社 2024-10-22 CN disclosed
WO-2024029475-A1 WAVELENGTH CONVERSION FILM FORMING COMPOSITION 日産化学株式会社 2024-02-08 WO disclosed
CN-117460611-A Method for manufacturing film roll and convex adjusting system used in manufacturing film roll 柯尼卡美能达株式会社 2024-01-26 CN disclosed
EP-1314552-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2003-05-28 EP disclosed
CN-1367193-A Hydrophilic Polymer containing silane couple end base and lithographic printing plate bottom material FUJI PHOTO FILM CO LTD (JP) 2002-09-04 CN disclosed
US-6423467-B1 USEFUL IN A LITHOGRAPHIC PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 2002-07-23 US disclosed
US-20020086233-A1 Useful in a lithographic printing plates FUJIFILM CORPORATION (JP) 2002-07-04 US disclosed
US-20020051929-A1 Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life FUJIFILM CORPORATION (JP) 2002-05-02 US disclosed
EP-0949539-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1999-10-13 EP disclosed
US-5858604-A PREPARED FROM DIGITAL IMAGE SIGNALS WITH USE OF PRESENSITIZED LITHOGRAPHIC PLATE KONICA CORPORATION (JP) 1999-01-12 US disclosed
EP-0720057-A1 ORIGINAL FORM FOR LITHOGRAPHIC PLATE AND PROCESS FOR PREPARING LITHOGRAPHIC PLATE KONICA CORPORATION (JP) 1996-07-03 EP disclosed
EP-0421381-A2 A method for transferring images and an apparatus used therefor KONICA CORPORATION (JP) 1991-04-10 EP disclosed