Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | GLA | P06280 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | MGLL | Q99685 | 3/20 | 0.33 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | HTR1A | P08908 | 1/20 | 0.32 |
| ▸ | HTR7 | P34969 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3756036 | 0.87 | ALDH1A1 (0.40) | ALDH1A1TDP1GLATSHRSMN1; SMN2 | |
| SCHEMBL29378307 | 0.87 | ALDH1A1 (0.40) | ALDH1A1TDP1GLATSHRSMN1; SMN2 | |
| SCHEMBL17761547 | 0.85 | ALDH1A1 (0.50) | ALDH1A1TDP1GLATSHRSMN1; SMN2 | |
| SCHEMBL1357681 | 0.85 | ALDH1A1 (0.41) | ALDH1A1TDP1GLATSHRSMN1; SMN2 | |
| SCHEMBL732958 | 0.83 | TDP1 (0.52) | ALDH1A1TDP1GLATSHRSMN1; SMN2 | |
| SCHEMBL3751496 | 0.83 | ALDH1A1 (0.44) | ALDH1A1TDP1GLATSHRSMN1; SMN2 | |
| SCHEMBL20526225 | 0.81 | ALDH1A1 (0.47) | ALDH1A1TDP1GLATSHRSMN1; SMN2 | |
| SCHEMBL3752522 | 0.81 | ALDH1A1 (0.40) | ALDH1A1TDP1TSHRSMN1; SMN2TP53 | |
| SCHEMBL29378506 | 0.81 | ALDH1A1 (0.40) | ALDH1A1TDP1TSHRSMN1; SMN2TP53 | |
| SCHEMBL4865007 | 0.81 | ALDH1A1 (0.40) | ALDH1A1TDP1TSHRSMN1; SMN2TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2838 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121574424-A | Reinforcing agent for nitrile rubber, preparation method and application | 潍坊军涛化工有限公司 | 2026-02-27 | — | — | CN | claimed |
| EP-4619470-A1 | SILANE COMPOUND AND COMPOSITIONS CONTAINING SAME | Synthomer Sdn. Bhd. (MY) | 2025-09-24 | — | — | EP | claimed |
| US-20250242558-A1 | METHOD FOR REPAIRING OR RECYCLING AN ELASTOMERIC FILM | SYNTHOMER SDN. BHD. (MY) | 2025-07-31 | — | — | US | claimed |
| US-12365153-B2 | Method for repairing or recycling an elastomeric film | SYNTHOMER SDN. BHD. (MY) | 2025-07-22 | — | — | US | claimed |
| CN-120202247-A | Silane compound and composition containing same | 昕特玛私人有限公司 | 2025-06-24 | — | — | CN | claimed |
| CN-113365570-B | Polymer latex and elastomeric film with self-healing properties made therefrom | 昕特玛(英国)有限公司 | 2025-05-30 | — | — | CN | claimed |
| CN-119872022-A | High-heat-conductivity aluminum-based composite copper-clad plate and processing technology thereof | 深圳市鑫荣进绝缘材料有限公司 | 2025-04-25 | — | — | CN | claimed |
| EP-3464453-B1 | POLYMER LATEX FOR DIP-MOLDING APPLICATIONS | SYNTHOMER SDN BHD (MY) | 2025-04-16 | — | — | EP | claimed |
| CN-119805862-A | Colored photosensitive resin composition, color filter, developing device and preparation method | 阜阳欣奕华新材料科技股份有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-112241107-B | Positive photosensitive resin composition, photosensitive resin film and display device using the same | 株式会社东进世美肯 | 2025-03-11 | — | — | CN | claimed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | claimed |
| WO-2003079402-A2 | LATEX BASED ADSORBENT CHIP | CIPHERGEN BIOSYSTEMS, INC. (US) | 2003-09-25 | — | — | WO | claimed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | claimed |
| WO-2003036388-A1 | PHOTOSNESITIVE RESIN COMPOSITION COMPRISING QUINONEDIAZIDE SULFATE ESTER COMPOUND | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-05-01 | — | — | WO | claimed |
| WO-2003017001-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTORESIST | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-02-27 | — | — | WO | claimed |
| US-20030032043-A1 | Latex based adsorbent chip | CIPHERGEN BIOSYSTEMS, INC. | 2003-02-13 | — | — | US | claimed |
| US-20030017464-A1 | Latex based adsorbent chip | CIPHERGEN BIOSYSTEMS, INC. | 2003-01-23 | — | — | US | claimed |
| US-20020045708-A1 | Catalytic metal oxide or Lewis acid carried on a crosslinked polymeric compound with excellent solvent resistance, heat resistance, etc. and is not degraded in its activity even after repeating use. | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2002-04-18 | — | — | US | claimed |
| EP-1164148-A1 | Metal compound composition | Wako Pure Chemical Industries, Ltd. (JP) | 2001-12-19 | — | — | EP | claimed |
| US-6051353-A | REACTION PRODUCT OF GLYCIDYL METHACRYLATE POLYMER WITH AMINOALKYL OR (AMINOALKYL)AMINOALKYL METHACRYLATE POLYMER | XEROX CORPORATION (US) | 2000-04-18 | — | — | US | claimed |