SCHEMBL732958

SCHEMBL732958

c1ccc(COCC2CO2)c(COCC2CO2)c1

nearest known ligand 0.52

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.52
ALDH1A1 P00352 4/20 0.47
GLA P06280 1/20 0.47
TSHR P16473 4/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
TP53 P04637 2/20 0.46
CYP3A4 P08684 1/20 0.46
HIF1A Q16665 1/20 0.46
MAPK1 P28482 1/20 0.41
MEN1 O00255 3/20 0.40
KMT2A Q03164 3/20 0.40
LMNA P02545 1/20 0.39
MGLL Q99685 2/20 0.38
CYP1A2 P05177 1/20 0.37
MAPT P10636 1/20 0.37
HPGD P15428 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10364350 0.91 TDP1 (0.44) TDP1ALDH1A1GLATSHRSMN1; SMN2
SCHEMBL28407405 0.90 ALDH1A1 (0.56) TDP1ALDH1A1GLATSHRSMN1; SMN2
SCHEMBL5185728 0.87 TDP1 (0.44) TDP1ALDH1A1GLATSHRSMN1; SMN2
SCHEMBL10844477 0.87 IDO1 (0.47) TDP1ALDH1A1GLATSHRSMN1; SMN2
SCHEMBL6794073 0.87 IDO1 (0.47) TDP1ALDH1A1GLATSHRSMN1; SMN2
SCHEMBL20526225 0.87 ALDH1A1 (0.47) TDP1ALDH1A1GLATSHRSMN1; SMN2
SCHEMBL8159322 0.86 TDP1 (0.43) TDP1ALDH1A1GLATSHRSMN1; SMN2
SCHEMBL730659 0.86 ALDH1A1 (0.60) TDP1ALDH1A1GLATSHRSMN1; SMN2
SCHEMBL17667231 0.84 CHRNB2 (0.53) TDP1ALDH1A1GLATSHRSMN1; SMN2
SCHEMBL10846097 0.84 IDO1 (0.50) TDP1ALDH1A1GLAMAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114525072-A Polyethers containing cyclic groups other than bisphenols 宣伟投资管理有限公司 2022-05-24 CN claimed
EP-2788398-B1 SULFIDE EXTENDED EPOXY RESINS AND BARRIER COATINGS APPLICATIONS THEREOF SUN CHEMICAL CORP (US) 2018-07-25 EP claimed
CN-104039862-B Sulfide-extended epoxy resin and application of barrier coating thereof 太阳化学公司 2017-12-22 CN claimed
US-9624380-B2 Sulfide extended epoxy resins and barrier coating applications thereof SUN CHEMICAL CORPORATION (US) 2017-04-18 US claimed
US-20140370220-A1 OVERPRINT VARNISHES WITH NON-AQUOUS DISPERSIONS SUN CHEMICAL CORPORATION (US) 2014-12-18 US claimed
US-20140342091-A1 SULFIDE EXTENDED EPOXY RESINS AND BARRIER COATING APPLICATIONS THEREOF SUN CHEMICAL CORPORATION (US) 2014-11-20 US claimed
EP-2788398-A2 SULFIDE EXTENDED EPOXY RESINS AND BARRIER COATINGS APPLICATIONS THEREOF Sun Chemical Corporation (US) 2014-10-15 EP claimed
WO-2013090702-A2 SULFIDE EXTENDED EPOXY RESINS AND BARRIER COATINGS APPLICATIONS THEREOF SUN CHEMICAL CORPORATION (US) 2013-06-20 WO claimed
US-20240239954-A1 POLYESTER COPOLYMER AND COATING COMPOSITIONS THEREFROM HAVING IMPROVED CORROSION RESISTANCE SWIMC LLC (US) 2024-07-18 US disclosed
EP-4347733-A1 POLYESTER COPOLYMER AND COATING COMPOSITIONS THEREFROM HAVING IMPROVED CORROSION RESISTANCE Swimc LLC (US) 2024-04-10 EP disclosed
WO-2022251858-A1 POLYESTER COPOLYMER AND COATING COMPOSITIONS THEREFROM HAVING IMPROVED CORROSION RESISTANCE SWIMC LLC (US) 2022-12-01 WO disclosed
CN-114525072-A Polyethers containing cyclic groups other than bisphenols 宣伟投资管理有限公司 2022-05-24 CN disclosed
EP-2123695-B1 METAL THIETANE COMPOUND, POLYMERIZABLE COMPOSITION COMPRISING THE COMPOUND, RESIN, AND USE OF THE RESIN MITSUI CHEMICALS INC (JP) 2021-06-23 EP disclosed
US-20200317953-A1 POLYETHERS CONTAINING NON-BISPHENOLIC CYCLIC GROUPS SWIMC LLC (US) 2020-10-08 US disclosed
US-20070112100-A1 MERCAPTAN-HARDENED EPOXY POLYMER COMPOSITIONS AND PROCESSES FOR MAKING AND USING SAME CHEVRON PHILLIPS CHEMICAL COMPANY, LP 2007-05-17 US disclosed
WO-2007022217-A1 MERCAPTAN-HARDENED EPOXY POLYMER COMPOSITIONS AND PROCESSES FOR MAKING AND USING SAME CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2007-02-22 WO disclosed
US-7132501-B2 Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS, INC. (JP) 2006-11-07 US disclosed
US-20050215757-A1 Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition MITSUI CHEMICALS, INC. (JP) 2005-09-29 US disclosed
EP-1482002-A1 POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION MITSUI CHEMICALS, INC. (JP) 2004-12-01 EP disclosed
US-4368237-A ORGANIC SOLVENT-FREE FUJI PHOTO FILM CO., LTD. (JP) 1983-01-11 US disclosed