SCHEMBL194334

SCHEMBL194334

C[CH]Oc1ccccc1O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 3/20 0.56
TP53 P04637 2/20 0.56
CA1 P00915 2/20 0.56
TSHR P16473 1/20 0.56
MAPT P10636 4/20 0.46
LMNA P02545 3/20 0.46
GAA P10253 3/20 0.46
JAK2 O60674 1/20 0.46
KDM4E B2RXH2 3/20 0.43
ALDH1A1 P00352 3/20 0.43
CYP3A4 P08684 2/20 0.43
HPGD P15428 2/20 0.43
ALOX15 P16050 2/20 0.43
HSD17B10 Q99714 2/20 0.43
MAPK1 P28482 2/20 0.43
ALOX12 P18054 1/20 0.43
NPC1 O15118 2/20 0.41
RAB9A P51151 2/20 0.41
TDP1 Q9NUW8 2/20 0.41
CA12 O43570 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8517929 0.82 CA2 (0.52) CA2TP53CA1TSHRMAPT
SCHEMBL9260031 0.82 CA2 (0.52) CA2TP53CA1TSHRMAPT
SCHEMBL10640071 0.77 TP53 (0.52) CA2TP53CA1TSHRMAPT
SCHEMBL1883142 0.76 TSHR (0.50) CA2TP53CA1TSHRMAPT
SCHEMBL5077616 0.76 CA2 (0.50) CA2TP53CA1TSHRMAPT
SCHEMBL28465083 0.76 CA2 (0.50) CA2TP53CA1TSHRMAPT
SCHEMBL29773031 0.76 CA2 (0.50) CA2TP53CA1TSHRMAPT
SCHEMBL1702501 0.76 CA2 (0.50) CA2TP53CA1TSHRMAPT
Ethylene Glycol SCHEMBL14875140 0.76 TP53 (0.45) CA2TP53CA1TSHRMAPT
Guaiacol SCHEMBL28160915 0.75 CA2 (0.95) CA2TP53CA1TSHRMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 142 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-1221300-A None JP disclosed
CN-112831278-B Photocurable resin composition KCC公司 2023-04-28 CN disclosed
EP-4119588-A1 PHOTOCURABLE RESIN COMPOSITION FOR IMPRINT MOLDING, RESIN MOLD, METHOD FOR FORMING PATTERN USING SAID RESIN MOLD, COMPOSITE MATERIAL HAVING SAID RESIN MOLD, METHOD FOR PRODUCING SAID COMPOSITE MATERIAL, AND METHOD FOR PRODUCING OPTICAL MEMBER Toyo Gosei Co., Ltd. (JP) 2023-01-18 EP disclosed
CN-115250635-A Photocurable resin composition for imprint mold, resin mold, pattern forming method using resin mold, composite body having resin mold, method for producing composite body, and method for producing optical member 东洋合成工业株式会社 2022-10-28 CN disclosed
CN-115073661-A Resin composition and display device using same 三星显示有限公司 2022-09-20 CN disclosed
CN-109970919-B Photocurable resin composition and method for manufacturing window member using same 三星显示有限公司 2022-05-03 CN disclosed
US-11209734-B2 Oxime ester photoinitiators BASF SE 2021-12-28 US disclosed
US-11209733-B2 Oxime ester photoinitiators BASF SE 2021-12-28 US disclosed
US-11204554-B2 Oxime ester photoinitiators BASF SE 2021-12-21 US disclosed
CN-112831278-A Photocurable resin composition KCC公司 2021-05-25 CN disclosed
EP-1410109-A1 PHOTOSENSITIVE RESIN COMPOSITION Ciba SC Holding AG (CH) 2004-04-21 EP disclosed
EP-1395615-A1 OXIME ESTER PHOTOINITIATORS HAVING A COMBINED STRUCTURE Ciba SC Holding AG (CH) 2004-03-10 EP disclosed
US-6596445-B1 Initiators for photopolymerization of radically polymerizable compounds CIBA SPECIALTY CHEMICALS CORPORATION 2003-07-22 US disclosed
WO-2003010602-A1 PHOTOSENSITIVE RESIN COMPOSITION CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2003-02-06 WO disclosed
WO-2002100903-A1 OXIME ESTER PHOTOINITIATORS HAVING A COMBINED STRUCTURE CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2002-12-19 WO disclosed
US-6440856-B1 GOOD FOR CHEMICAL MECHANICAL POLISHING ABRASIVE PARTICLES SUCH AS SILICA AND ALUMINA; POLYMER OR COPOLYMER HAVING AT LEAST ONE GROUP SELECTED FROM THE GROUP CONSISTING OF SULFONIC ACID AND CARBOXYLIC ACID JSR CORPORATION (JP) 2002-08-27 US disclosed
US-20020020832-A1 Photosensitive resin composition CIBA SPECIALTY CHEMICALS CORP. 2002-02-21 US disclosed
US-20010012596-A1 For resist applications; thermostability, storage stability CIBA SPECIALTY CHEMICALS CORP. 2001-08-09 US disclosed
US-5663212-A Light-sensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1997-09-02 US disclosed
JP-H01221300-A TILE FOR DECORATION AND PRODUCTION OF DECORATIVE TILE BY USE OF SAID TILE KEMITETSUKU KK 1989-09-04 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11209734-B2 Oxime ester photoinitiators OR10J3, OXER1, QSOX1 CA2 1370/4885TP53 2497/4885CA1 1190/4885
US-11204554-B2 Oxime ester photoinitiators OR10J3, OXER1, QSOX1 CA2 1368/4885TP53 2415/4885CA1 1205/4885
US-11209733-B2 Oxime ester photoinitiators OR10J3, OXER1, QSOX1 CA2 1370/4885TP53 2497/4885CA1 1190/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.