SCHEMBL194429

SCHEMBL194429

O=C(OCCOCCO)C(=O)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.45
GAA P10253 2/20 0.44
CES2 O00748 6/20 0.43
CES1 P23141 5/20 0.43
ALDH1A1 P00352 5/20 0.42
MAPT P10636 1/20 0.42
TDP1 Q9NUW8 2/20 0.42
LMNA P02545 1/20 0.40
KMT2A Q03164 3/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
MEN1 O00255 2/20 0.39
KDM4E B2RXH2 1/20 0.39
TSHR P16473 1/20 0.38
PTK2B Q14289 1/20 0.38
HPGD P15428 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13875404 1.00 SMN1; SMN2 (0.45) SMN1; SMN2GAACES2CES1ALDH1A1
SCHEMBL3312136 0.93 CES2 (0.50) SMN1; SMN2GAACES2CES1ALDH1A1
SCHEMBL30478610 0.93 CES2 (0.50) SMN1; SMN2GAACES2CES1ALDH1A1
SCHEMBL13982035 0.93 CES2 (0.50) SMN1; SMN2GAACES2CES1ALDH1A1
SCHEMBL665971 0.93 CES2 (0.50) SMN1; SMN2GAACES2CES1ALDH1A1
SCHEMBL12154914 0.89 CES2 (0.50) GAACES2CES1ALDH1A1MAPT
Benzil SCHEMBL18393363 0.87 CES2 (0.58) SMN1; SMN2GAACES2CES1ALDH1A1
Benzil SCHEMBL28157555 0.87 CES2 (0.58) SMN1; SMN2GAACES2CES1ALDH1A1
SCHEMBL4738627 0.87 CES2 (0.56) SMN1; SMN2GAACES2CES1ALDH1A1
SCHEMBL29257166 0.87 SMN1; SMN2 (0.42) SMN1; SMN2GAACES2CES1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1737 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3630855-B1 LOW-VISCOSITY PHOTOCURABLE ADHESIVE COMPOSITIONS HENKEL AG & CO KGAA (DE) 2024-05-01 EP claimed
US-11794452-B2 Thermoplastic polymer film with interpenetrating polymer network ARGOTEC LLC 2023-10-24 US claimed
US-11702571-B2 Adhesive sheet for temporary fixation and method of manufacturing semiconductor device using the same LG CHEM, LTD. (KR) 2023-07-18 US claimed
CN-116425634-A Synthetic method and product of mixed ester photoinitiator 浙江东海新材料科技股份有限公司 2023-07-14 CN claimed
CN-111163922-B Natural rubber mould-free manufacturing method 国家科学技术发展局 2023-03-14 CN claimed
CN-115340834-A Explosion-proof membrane and preparation method thereof 新纶电子材料(常州)有限公司 2022-11-15 CN claimed
CN-111836867-B Adhesive composition 株式会社LG化学 2022-09-30 CN claimed
CN-115011283-A Hot melt adhesive particle, laminated busbar insulation adhesive film and preparation method thereof 新纶电子材料(常州)有限公司 2022-09-06 CN claimed
US-11382868-B2 Transdermal UV-curable hydrogel resin, hydrogel curing the same and cataplasm containing the same ICURE PHARMACEUTICAL INC. (KR) 2022-07-12 US claimed
CN-114736627-A Semi-solidified pressure-sensitive polymer film, foldable glass cover plate and preparation methods of semi-solidified pressure-sensitive polymer film and foldable glass cover plate 新纶电子材料(常州)有限公司 2022-07-12 CN claimed
EP-2221664-A1 Nanolithography process Solvay Solexis S.p.A. (IT) 2010-08-25 EP claimed
EP-2182410-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PHOTOSENSITIVE RESIN PRODUCT, PHOTOSENSITIVE RESIN FILM, CURED PHOTOSENSITIVE RESIN FILM PRODUCT, AND OPTICAL WAVEGUIDE PRODUCED BY USING THOSE PRODUCTS Hitachi Chemical Company, Ltd. (JP) 2010-05-05 EP claimed
US-20100027950-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN CURED MATTER, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE RESIN FILM CURED MATTER AND OPTICAL WAVEGUIDE OBTAINED BY USING THE SAME HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-02-04 US claimed
US-20090312453-A1 Composition for Alignment Film Having Excellent Adhesiveness LG CHEM, LTD. (KR) 2009-12-17 US claimed
EP-2053087-A1 RESIN COMPOSITION FOR OPTICAL USE, RESIN MATERIAL FOR OPTICAL USE USING THE SAME, OPTICAL FILTER FOR IMAGE DISPLAY DEVICE, AND IMAGE DISPLAY DEVICE Hitachi Chemical Co., Ltd. (JP) 2009-04-29 EP claimed
WO-2008079519-A1 PHOTOSENSITIVE COMPOSITION WITH LOW YELLOWING UNDER UV-LIGHT AND SUNLIGHT EXPOSURE CLAST TRADING LIMITED (CN) 2008-07-03 WO claimed
WO-2008073664-A1 POLY(ETHYLENEOXIDE) SILOXANE GEL ELECTROLYTES UCHICAGO ARGONNE, LLC (US) 2008-06-19 WO claimed
US-20080134492-A1 POLY(ETHYLENEOXIDE) SILOXANE GEL ELECTROLYTES UCHICAGO ARGONNE, LLC 2008-06-12 US claimed
US-7309550-B2 Photosensitive composition with low yellowing under UV-light and sunlight exposure CHEMENCE, INC. (US) 2007-12-18 US claimed
US-20070099119-A1 Photosensitive composition with low yellowing under UV-light and sunlight exposure CHEMENCE, INC. 2007-05-03 US claimed