SCHEMBL194638

SCHEMBL194638

CCC(=O)OC(=O)C(C(C)=O)C(=O)CC.[AlH3]

nearest known ligand 0.32

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.32
ALDH1A1 P00352 3/20 0.31
LMNA P02545 1/20 0.31
HSD17B10 Q99714 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
MGAM O43451 1/20 0.30
GAA P10253 1/20 0.30
SI P14410 1/20 0.30
MGAM2 Q2M2H8 1/20 0.30
SOAT1 P35610 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8679475 0.87 NAAA (0.37) NAAAALDH1A1LMNAHSD17B10TDP1
SCHEMBL1690418 0.79 ALDH1A1 (0.50) ALDH1A1LMNAHSD17B10
SCHEMBL3303175 0.78 ALDH1A1 (0.44) ALDH1A1LMNAHSD17B10TDP1MGAM
SCHEMBL10485422 0.78 CA1 (0.36) ALDH1A1LMNAHSD17B10TDP1MGAM
SCHEMBL27692817 0.77 ALDH1A1 (0.32) ALDH1A1LMNAHSD17B10TDP1SOAT1
SCHEMBL1802349 0.77 ALDH1A1 (0.44) ALDH1A1LMNAHSD17B10TDP1
SCHEMBL8543975 0.77 ALDH1A1 (0.44) ALDH1A1LMNAHSD17B10TDP1
SCHEMBL288537 0.76 MGAM (0.44) NAAAALDH1A1MGAMGAASI
SCHEMBL6709728 0.75 ALDH1A1 (0.50) ALDH1A1LMNAHSD17B10
SCHEMBL28016212 0.71 NAAA (0.35) NAAAALDH1A1LMNAHSD17B10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240301222-A1 ACTIVE ENERGY RAY-CURABLE OFFSET PRINTING INK COMPOSITION SAKATA INX CORPORATION (JP) 2024-09-12 US disclosed
US-20240228803-A9 ACTIVE ENERGY RAY-CURABLE OFFSET PRINTING INK COMPOSITION SAKATA INX CORPORATION (JP) 2024-07-11 US disclosed
US-20240132734-A1 ACTIVE ENERGY RAY-CURABLE OFFSET PRINTING INK COMPOSITION SAKATA INX CORP (JP) 2024-04-25 US disclosed
EP-4328023-A1 ACTINIC RAY-CURABLE OFFSET PRINTING INK COMPOSITION Sakata INX Corporation (JP) 2024-02-28 EP disclosed
EP-4299310-A1 ACTIVE-ENERGY-RAY-CURABLE OFFSET PRINTING INK COMPOSITION Sakata INX Corp. (JP) 2024-01-03 EP disclosed
WO-2022224812-A1 ACTINIC RAY-CURABLE OFFSET PRINTING INK COMPOSITION サカタインクス株式会社 2022-10-27 WO disclosed
EP-2573123-A1 ROSIN-MODIFIED PHENOL RESIN, PROCESS FOR PRODUCTION THEREOF, VARNISH FOR PRINTING INK, AND PRINTING INK Arakawa Chemical Industries, Ltd. (JP) 2013-03-27 EP disclosed
US-20130065990-A1 ROSIN-MODIFIED PHENOLIC RESIN, PROCESS FOR PRODUCTION THEREOF, VARNISH FOR PRINTING INK, AND PRINTING INK ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) 2013-03-14 US disclosed
US-20120010358-A1 ROSIN-MODIFIED PHENOL RESIN, MANUFACTURING METHOD THEREOF, AND PRINTING INK ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) 2012-01-12 US disclosed
EP-2402378-A1 ROSIN-MODIFIED PHENOL RESIN, MANUFACTURING METHOD THEREOF, AND PRINTING INK Arakawa Chemical Industries, Ltd. (JP) 2012-01-04 EP disclosed