SCHEMBL194772

SCHEMBL194772

C=COC(=O)c1cc(Cl)c(Cl)c(Cl)c1Cl

nearest known ligand 0.36

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.36
HPGD P15428 2/20 0.34
TSHR P16473 2/20 0.34
HSD17B10 Q99714 2/20 0.34
HSP90AA1 P07900 1/20 0.34
AKR1B1 P15121 1/20 0.31
MAPK1 P28482 1/20 0.30
GAA P10253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6758329 0.89 CES2 (0.41) HPGDGAA
SCHEMBL8776820 0.83
SCHEMBL27491928 0.78 CYP3A4 (0.34) CYP3A4HPGDTSHRHSD17B10GAA
SCHEMBL11406014 0.78 CYP3A4 (0.43) CYP3A4HPGDTSHRHSD17B10HSP90AA1
SCHEMBL20577112 0.78 CYP3A4 (0.43) CYP3A4HPGDTSHRHSD17B10HSP90AA1
SCHEMBL18725860 0.75 KDM4E (0.35) CYP3A4
SCHEMBL8331805 0.75 GAA (0.51) CYP3A4HPGDGAA
SCHEMBL9313245 0.73 SMN1; SMN2 (0.53) HPGDTSHRMAPK1GAA
SCHEMBL194413 0.72 CES2 (0.52) CYP3A4HPGDGAA
SCHEMBL9328634 0.70 CA12 (0.46) CYP3A4HPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 602 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5698361-A DIAZONIUM COMPOUND, POLYMERIC BINDER; DURABILITY FUJI PHOTO FILM CO., LTD. (JP) 1997-12-16 US claimed
US-4087574-A PHOTOGRAPHY, VINYL OR VINYLIDENE CHLORIDE POLYMERS FUJI PHOTO FILM CO., LTD. (JA) 1978-05-02 US claimed
EP-4743828-A1 PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING BASF SE (DE) 2026-05-20 EP disclosed
CN-120118458-A Curable composition, resin, and cured product 东京应化工业株式会社 2025-06-10 CN disclosed
CN-120044752-A Photosensitive resin composition 东京应化工业株式会社 2025-05-27 CN disclosed
CN-120044751-A Photosensitive resin composition 东京应化工业株式会社 2025-05-27 CN disclosed
US-12312489-B2 Curable composition, cured product and method for forming insulating film TOKYO OHKA KOGYO CO., LTD. (JP) 2025-05-27 US disclosed
CN-119937242-A Photosensitive resin composition 东京应化工业株式会社 2025-05-06 CN disclosed
WO-2025011754-A1 PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING BASF SE (DE) 2025-01-16 WO disclosed
CN-112394438-B Method for manufacturing color filter, and resin composition 东京应化工业株式会社 2025-01-03 CN disclosed
EP-4114825-B1 OXIME ESTER PHOTOINITIATORS BASF SE (DE) 2024-11-20 EP disclosed
US-4075237-A Perfluorinated esters of fumaric acid and certain other ethylenically unsaturated poly-basic acid and soil repellant polymers thereof GEIGY CHEMICAL CORPORATION (US) 1978-02-21 US disclosed
US-4065435-A OXIDATION-REDUCTION PROPERTIES, ACRYLIC FUJI PHOTO FILM CO., LTD. (JA) 1977-12-27 US disclosed
US-4058443-A PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN FUJI PHOTO FILM CO., LTD. (JA) 1977-11-15 US disclosed
US-4054722-A PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JA) 1977-10-18 US disclosed
US-4050936-A Image forming process with photopolymer layers between a support and a substrate FUJI PHOTO FILM CO., LTD. (JA) 1977-09-27 US disclosed
US-4041017-A Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams FUJI PHOTO FILM CO., LTD. (JA) 1977-08-09 US disclosed
US-3963495-A Image-receiving element for silver salt diffusion transfer with layer of monoacrylates or monomethacrylates of polyhydric alcohols FUJI PHOTO FILM CO., LTD. (JA) 1976-06-15 US disclosed
US-3936429-A Reactive polymer FUJI PHOTO FILM CO., LTD. (JA) 1976-02-03 US disclosed
US-3931248-A Reactive high polymer compound FUJI PHOTO FILM CO., LTD. (JA) 1976-01-06 US disclosed