Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LIG1 | P18858 | 1/20 | 0.71 |
| ▸ | MAPT | P10636 | 6/20 | 0.54 |
| ▸ | HPGD | P15428 | 4/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.54 |
| ▸ | LMNA | P02545 | 3/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.54 |
| ▸ | RECQL | P46063 | 2/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.54 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.54 |
| ▸ | ESR1 | P03372 | 1/20 | 0.54 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.54 |
| ▸ | PKM | P14618 | 1/20 | 0.54 |
| ▸ | HTT | P42858 | 1/20 | 0.54 |
| ▸ | MEN1 | O00255 | 4/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.52 |
| ▸ | USP2 | O75604 | 1/20 | 0.52 |
| ▸ | GAA | P10253 | 1/20 | 0.52 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30063629 | 1.00 | LIG1 (0.71) | LIG1MAPTHPGDALDH1A1LMNA | |
| SCHEMBL28963451 | 0.93 | LIG1 (0.68) | LIG1MAPTHPGDALDH1A1LMNA | |
| SCHEMBL6568212 | 0.93 | LIG1 (0.62) | LIG1MAPTHPGDALDH1A1LMNA | |
| SCHEMBL5351790 | 0.86 | LIG1 (0.53) | LIG1HPGDALDH1A1KDM4EHSD17B10 | |
| SCHEMBL27513069 | 0.86 | LIG1 (0.58) | LIG1MAPTHPGDALDH1A1LMNA | |
| SCHEMBL147459 | 0.86 | GAA (0.58) | LIG1MAPTHPGDALDH1A1LMNA | |
| SCHEMBL29767790 | 0.86 | GAA (0.58) | LIG1MAPTHPGDALDH1A1LMNA | |
| SCHEMBL29366288 | 0.86 | HDAC1 (0.66) | LIG1MAPTHPGDALDH1A1LMNA | |
| SCHEMBL93340 | 0.86 | HDAC1 (0.66) | LIG1MAPTHPGDALDH1A1LMNA | |
| SCHEMBL6652372 | 0.84 | GAA (0.56) | LIG1MAPTHPGDALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 110 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103222012-B | There is the energy cable of the thermoplasticity electric insulation layer of voltage stabilization | PRYSMIAN S.P.A. (IT) | 2015-09-02 | — | — | CN | claimed |
| EP-2643837-B1 | ENERGY CABLE HAVING A VOLTAGE STABILIZED THERMOPLASTIC ELECTRICALLY INSULATING LAYER | PRYSMIAN SPA (IT) | 2015-03-04 | — | — | EP | claimed |
| EP-2643837-A1 | ENERGY CABLE HAVING A VOLTAGE STABILIZED THERMOPLASTIC ELECTRICALLY INSULATING LAYER | Prysmian S.p.A. (IT) | 2013-10-02 | — | — | EP | claimed |
| US-20130233604-A1 | ENERGY CABLE HAVING A VOLTAGE STABILIZED THERMOPLASTIC ELECTRICALLY INSULATING LAYER | PRYSMIAN S.P.A. (IT) | 2013-09-12 | — | — | US | claimed |
| CN-103222012-A | Energy cable having a voltage stabilized thermoplastic electrically insulating layer | PRYSMIAN SPA | 2013-07-24 | — | — | CN | claimed |
| WO-2012069864-A1 | ENERGY CABLE HAVING A VOLTAGE STABILIZED THERMOPLASTIC ELECTRICALLY INSULATING LAYER | PRYSMIAN S.P.A. (IT) | 2012-05-31 | — | — | WO | claimed |
| CN-112399992-B | Polycarbonate resin composition and article comprising same | 株式会社LG化学 | 2022-12-20 | — | — | CN | disclosed |
| CN-108732868-B | Positive resist film laminate and pattern forming method | 信越化学工业株式会社 | 2022-12-13 | — | — | CN | disclosed |
| US-10719015-B2 | Positive resist film laminate and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-21 | — | — | US | disclosed |
| EP-3392708-B1 | POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-03-18 | — | — | EP | disclosed |
| EP-3392708-A1 | POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2018-10-24 | — | — | EP | disclosed |
| US-20180299774-A1 | POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-10-18 | — | — | US | disclosed |
| US-9921476-B2 | Positive-type photosensitive resin composition, and insulating film and OLED formed using the same | KOLON INDUSTRIES, INC. (KR) | 2018-03-20 | — | — | US | disclosed |
| EP-0525185-A1 | POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1993-02-03 | — | — | EP | disclosed |
| EP-0510671-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-10-28 | — | — | EP | disclosed |
| EP-0510670-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-10-28 | — | — | EP | disclosed |
| US-5130225-A | And alkali soluble resin, a quinone oxazide compound and a hydroxyl containing compound, film thickness retention | SUMITOMO CHEMICAL CO. LTD. (JP) | 1992-07-14 | — | — | US | disclosed |
| EP-0461388-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-18 | — | — | EP | disclosed |
| EP-0461654-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-18 | — | — | EP | disclosed |
| EP-0460416-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-11 | — | — | EP | disclosed |