Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC1 | Q13547 | 1/20 | 0.66 |
| ▸ | MAPT | P10636 | 6/20 | 0.61 |
| ▸ | HPGD | P15428 | 5/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.61 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.61 |
| ▸ | RECQL | P46063 | 3/20 | 0.61 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.61 |
| ▸ | LMNA | P02545 | 3/20 | 0.61 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.61 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.61 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.61 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.60 |
| ▸ | LIG1 | P18858 | 1/20 | 0.57 |
| ▸ | ESR1 | P03372 | 1/20 | 0.56 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.56 |
| ▸ | PKM | P14618 | 1/20 | 0.56 |
| ▸ | HTT | P42858 | 1/20 | 0.56 |
| ▸ | SELL | P14151 | 1/20 | 0.54 |
| ▸ | SELP | P16109 | 1/20 | 0.54 |
| ▸ | MEN1 | O00255 | 4/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29366288 | 1.00 | HDAC1 (0.66) | HDAC1MAPTHPGDALDH1A1KDM4E | |
| SCHEMBL3656665 | 0.94 | HDAC1 (0.73) | HDAC1MAPTHPGDALDH1A1KDM4E | |
| SCHEMBL8861471 | 0.93 | MEN1 (0.61) | HDAC1MAPTHPGDALDH1A1KDM4E | |
| SCHEMBL6568212 | 0.91 | LIG1 (0.62) | HDAC1MAPTHPGDALDH1A1KDM4E | |
| SCHEMBL30063629 | 0.86 | LIG1 (0.71) | HDAC1MAPTHPGDALDH1A1KDM4E | |
| SCHEMBL1947873 | 0.86 | LIG1 (0.71) | HDAC1MAPTHPGDALDH1A1KDM4E | |
| SCHEMBL5689404 | 0.85 | MEN1 (0.76) | HDAC1MAPTHPGDALDH1A1KDM4E | |
| SCHEMBL6568215 | 0.85 | HDAC1 (0.58) | HDAC1MAPTHPGDALDH1A1KDM4E | |
| SCHEMBL28033673 | 0.85 | MAPT (0.51) | HDAC1MAPTHPGDALDH1A1KDM4E | |
| SCHEMBL2053270 | 0.85 | HDAC1 (0.58) | HDAC1MAPTHPGDALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2802 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230407114-A1 | THREE-DIMENSIONAL PRINTING | PERIDOT PRINT LLC | 2023-12-21 | — | — | US | claimed |
| US-20230194984-A1 | FLUORINE-CONTAINING RESIN COMPOSITION AND PREPARATION METHOD THEREOF, AND PREPARATION METHOD OF CURED FILM CONTAINING SAME | XI'AN MANARECO NEW MATERIALS CO., LTD. (CN) | 2023-06-22 | — | — | US | claimed |
| CN-115933334-A | Positive photoresist capable of developing reverse trapezoidal morphology, and preparation method and application thereof | 深圳市容大感光科技股份有限公司 | 2023-04-07 | — | — | CN | claimed |
| WO-2022115112-A1 | THREE-DIMENSIONAL PRINTING | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2022-06-02 | — | — | WO | claimed |
| CN-114478930-A | Preparation method of polybutadiene latex and prepared ABS resin | 万华化学集团股份有限公司 | 2022-05-13 | — | — | CN | claimed |
| CN-109824491-B | Production method of 2,3,4, 4' -tetrahydroxybenzophenone | 三峡大学 | 2022-03-08 | — | — | CN | claimed |
| CN-114137795-A | Photoresist composition and application thereof | 广东粤港澳大湾区黄埔材料研究院 | 2022-03-04 | — | — | CN | claimed |
| CN-114031736-A | Modified phenolic resin for photoresist, preparation method thereof and photoresist composition | 广东粤港澳大湾区黄埔材料研究院 | 2022-02-11 | — | — | CN | claimed |
| CN-113050376-A | Photosensitive resin composition for photoresist | 安徽邦铭新材料科技有限公司 | 2021-06-29 | — | — | CN | claimed |
| CN-112684661-A | Photoresist composition and preparation method thereof | 阜阳申邦新材料技术有限公司 | 2021-04-20 | — | — | CN | claimed |
| US-5080997-A | PROCESS FOR PREPARING A POSITIVE RESIST COMPOSITION BY MIXING THE CONDENSATION PRODUCT OF A QUINONE DIAZIDE SULFONYL HALOGENIDE AND A PHENOL WITH A RESIN SOLUTION WITHOUT ISOLATING THE CONDENSATION PRODUCT FROM THE CRUDE MIXTURE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-01-14 | — | — | US | claimed |
| US-5059507-A | Which is sensitive to ultraviolet rays and x-rays | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-10-22 | — | — | US | claimed |
| EP-0434442-A2 | Positive photoresist composition | HOECHST CELANESE CORPORATION (US) | 1991-06-26 | — | — | EP | claimed |
| EP-0415266-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-03-06 | — | — | EP | claimed |
| US-4988601-A | Novolak resins from 3,5-xylenol, m-cresol and/or p-cresol with a carbonyl compound and an o-quinonediazide photosensitizer or light sensitive elements | KABUSHIKI KAISHA TOSHIBA (JP) | 1991-01-29 | — | — | US | claimed |
| US-4985333-A | PHOTORESISTS FOR SEMICONDUCTORS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1991-01-15 | — | — | US | claimed |
| EP-0395346-A2 | Photosensitive composition | Fuji Photo Film Co., Ltd. (JP) | 1990-10-31 | — | — | EP | claimed |
| US-4859563-A | Positive photoresist composition | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1989-08-22 | — | — | US | claimed |
| EP-0295626-A2 | Photosensitive composition | HITACHI, LTD. (JP) | 1988-12-21 | — | — | EP | claimed |
| US-4719167-A | Positive photoresist composition with 1,2 naphthoquinone diazide and novolak resin condensed from mixture of m-cresol, p-cresol, and 2,5-xylenol with formaldehyde | MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) | 1988-01-12 | — | — | US | claimed |