⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3421280 | 0.77 | — | — | |
| SCHEMBL2450335 | 0.74 | — | — | |
| SCHEMBL446263 | 0.73 | — | — | |
| SCHEMBL152163 | 0.72 | LTA4H (0.32) | — | |
| SCHEMBL329137 | 0.72 | — | — | |
| SCHEMBL11783113 | 0.71 | — | — | |
| SCHEMBL1413 | 0.69 | — | — | |
| SCHEMBL9980586 | 0.69 | — | — | |
| SCHEMBL10395477 | 0.69 | ALDH1A1 (0.42) | — | |
| SCHEMBL1404380 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5874193-A | HOLE BLOCKING LAYER COMPRISED OF A CROSSLINKED POLYSILOXANE POLYMER; MINIMIZING DARK DECAY | XEROX CORPORATION (US) | 1999-02-23 | — | — | US | claimed |
| US-11687003-B2 | Negative resist pattern-forming method, and composition for upper layer film formation | JSR CORPORATION (JP) | 2023-06-27 | — | — | US | disclosed |
| US-11592746-B2 | Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid | JSR CORPORATION (JP) | 2023-02-28 | — | — | US | disclosed |
| CN-114764213-A | Negative photosensitive resin composition | 味之素株式会社 | 2022-07-19 | — | — | CN | disclosed |
| CN-114545738-A | Positive photosensitive resin composition | 味之素株式会社 | 2022-05-27 | — | — | CN | disclosed |
| US-10824073-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2020-11-03 | — | — | US | disclosed |
| US-20200341376-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID | JSR CORPORATION (JP) | 2020-10-29 | — | — | US | disclosed |
| US-20190004426-A1 | NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER LAYER FILM FORMATION | JSR CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| US-20180329298-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2018-11-15 | — | — | US | disclosed |
| US-10073344-B2 | Negative resist pattern-forming method, and composition for upper layer film formation | JSR CORPORATION (JP) | 2018-09-11 | — | — | US | disclosed |
| WO-2000020465-A1 | NOVEL CHAIN TRANSFER AGENTS | THE UNIVERSITY OF AKRON (US) | 2000-04-13 | — | — | WO | disclosed |
| US-5874193-A | HOLE BLOCKING LAYER COMPRISED OF A CROSSLINKED POLYSILOXANE POLYMER; MINIMIZING DARK DECAY | XEROX CORPORATION (US) | 1999-02-23 | — | — | US | disclosed |
| EP-0882738-A1 | DIENE RUBBER, PROCESS FOR PRODUCING THE RUBBER AND RUBBER COMPOSITION CONTAINING THE SAME | NIPPON ZEON CO., LTD. (JP) | 1998-12-09 | — | — | EP | disclosed |
| EP-0864592-A1 | DIENE RUBBER | NIPPON ZEON CO., LTD. (JP) | 1998-09-16 | — | — | EP | disclosed |
| US-5756777-A | THERMOSETTING RESINS; PHOTOPOLYMERIZABLE; CURABLE | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1998-05-26 | — | — | US | disclosed |
| US-4720446-A | Color photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1988-01-19 | — | — | US | disclosed |
| US-4596756-A | Ethylenically unsaturated monomer, unsaturated nitrile containing monomer | FUJI PHOTO FILM CO., LTD. (JP) | 1986-06-24 | — | — | US | disclosed |
| EP-0129219-A2 | Photographic elements | FUJI PHOTO FILM CO., LTD. (JP) | 1984-12-27 | — | — | EP | disclosed |
| US-4374924-A | CATIONIC POLYMERS COMPRISING QUATERNIZED COPOLYMERS OF P-DIVINYLBENZENE OR A DIACRYLIC ESTER AND AN AMINO-CONTAINING ACRYLIC ESTER OR AMIDE | FUJI PHOTO FILM CO., LTD. (JP) | 1983-02-22 | — | — | US | disclosed |
| US-4371582-A | INCORPORATING A WATER INSOLUBLE LATEX | FUJI PHOTO FILM CO., LTD. (JP) | 1983-02-01 | — | — | US | disclosed |