SCHEMBL195410

SCHEMBL195410

O=C1c2cc3ccccc3nc2C=CC1Cl

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 5/20 0.42
▸ MAPT P10636 4/20 0.42
▸ GLA P06280 2/20 0.42
▸ HPGD P15428 2/20 0.42
▸ ACHE P22303 1/20 0.42
▸ NPC1 O15118 5/20 0.41
▸ RAB9A P51151 5/20 0.41
▸ KMT2A Q03164 5/20 0.37
▸ MEN1 O00255 3/20 0.37
▸ TP53 P04637 2/20 0.37
▸ CYP3A4 P08684 2/20 0.37
▸ SMN1; SMN2 Q16637 2/20 0.37
▸ MAPK1 P28482 1/20 0.37
▸ HIF1A Q16665 1/20 0.37
▸ LMNA P02545 1/20 0.35
▸ PKM P14618 1/20 0.35
▸ PDE2A O00408 2/20 0.34
▸ PDE3B Q13370 2/20 0.34
▸ PDE3A Q14432 2/20 0.34
▸ HTR3A P46098 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5384651 0.82 RXFP1 (0.37) ACHENPC1RAB9AHTR3ACYP2C19
SCHEMBL354611 0.81 NPC1 (0.41) ALDH1A1MAPTGLAHPGDACHE
SCHEMBL71079 0.81 NPC1 (0.41) ALDH1A1MAPTGLAHPGDACHE
SCHEMBL3234460 0.81 NPC1 (0.41) ALDH1A1MAPTGLAHPGDACHE
SCHEMBL3735368 0.81 RAB9A (0.45) ALDH1A1MAPTGLAHPGDACHE
SCHEMBL7088775 0.81 NPC1 (0.41) ALDH1A1MAPTGLAHPGDACHE
SCHEMBL9690618 0.81 NPC1 (0.41) ALDH1A1MAPTGLAHPGDACHE
SCHEMBL3859298 0.81 NPC1 (0.41) ALDH1A1MAPTGLAHPGDACHE
SCHEMBL7088620 0.81 NPC1 (0.39) ALDH1A1MAPTGLAHPGDACHE
Hydrochloric Acid SCHEMBL1713917 0.80 NPC1 (0.41) ALDH1A1MAPTGLAHPGDACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 230 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0585457-B1 PHOTOCURABLE ADHESIVE JAPAN INST ADVANCED DENTISTRY (JP) 1996-10-02 — — EP claimed
US-12018189-B2 Composition for adhesives, outer package material for electricity storage devices, and method for producing same RESONAC CORPORATION (JP) 2024-06-25 — — US disclosed
WO-2023238286-A1 PHOTOSENSITIVE RESIN COMPOSITION ラサ工業株式会社 2023-12-14 — — WO disclosed
CN-111562720-B Photo-sensitized chemically amplified resist material, pattern forming method, semiconductor device, mask for lithography, and template for nanoimprint 东京毅力科创株式会社 2023-09-29 — — CN disclosed
CN-109694352-B Imidazole ketoxime ester compound, preparation method, composition and application 江苏裕事达新材料科技有限责任公司 2023-04-07 — — CN disclosed
CN-115536589-A Imidazole ketoxime ester compound, preparation method, composition and application 江苏裕事达新材料科技有限责任公司 2022-12-30 — — CN disclosed
EP-3162868-B1 THERMAL BASE GENERATOR, THERMOSETTING RESIN COMPOSITION, CURED FILM, CURED FILM MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2022-10-05 — — EP disclosed
US-20220127498-A1 COMPOSITION FOR ADHESIVES, OUTER PACKAGE MATERIAL FOR ELECTRICITY STORAGE DEVICES, AND METHOD FOR PRODUCING SAME SHOWA DENKO K.K. (JP) 2022-04-28 — — US disclosed
CN-107966877-B Composition for color filter 富士胶片株式会社 2022-04-12 — — CN disclosed
EP-3950867-A1 COMPOSITION FOR ADHESIVES, OUTER PACKAGE MATERIAL FOR ELECTRICITY STORAGE DEVICES, AND METHOD FOR PRODUCING SAME Showa Denko K.K. (JP) 2022-02-09 — — EP disclosed
US-5503074-A ALUMINUM BASE WITH SPECIFIED ROUGHNESS AND WHITENESS HAVING FORMED THEREON HOMOGENEOUS PRIMER LAYER COMPRISING BINDER, PHOTOSENSITIVE LAYER, SILICONE RUBBER LAYER FUJI PHOTO FILM CO., LTD. (JP) 1996-04-02 — — US disclosed
EP-0701170-A2 Photosensitive lithographic printing plate requiring no fountain solution and process for producing the same FUJI PHOTO FILM CO., LTD. (JP) 1996-03-13 — — EP disclosed
US-5432208-A Adhesives for glass or ceramics JAPAN INSTITUTE OF ADVANCED DENTISTRY (JP) 1995-07-11 — — US disclosed
EP-0652489-A1 Process for processing a photosensitive lithographic printing plate requiring no fountain solution FUJI PHOTO FILM CO., LTD. (JP) 1995-05-10 — — EP disclosed
US-5334486-A Reaction product of glycidyl methacrylate and a polyamine; photopolymerization initiator FUJI PHOTO FILM CO., LTD. (JP) 1994-08-02 — — US disclosed
EP-0585457-A1 PHOTOCURABLE ADHESIVE JAPAN INSTITUTE OF ADVANCED DENTISTRY (JP) 1994-03-09 — — EP disclosed
EP-0560347-A1 Method for preparing dry lithographic plates Fuji Photo Film Co., Ltd. (JP) 1993-09-15 — — EP disclosed
US-5232813-A PS PLATE FOR USE IN MAKING LITHOGRAPHIC PRINTING PLATE REQUIRING NO DAMPENING WATER UTILIZING IRRADIATION CURED PRIMER LAYER CONTAINING POLYURETHANE RESIN AND DIAZONIUM SALT POLYCONDENSATE PHOTOPOLYMERIZABLE LIGHT-SENSITIVE LAYER AND SILICONE RUBBER LAYER FUJI PHOTO FILM CO., LTD. (JP) 1993-08-03 — — US disclosed
EP-0492590-A1 Photopolymerizable composition and dry PS plate Fuji Photo Film Co., Ltd. (JP) 1992-07-01 — — EP disclosed
US-5061598-A PRESENSITIZED; DURABILITY, SCRATCH RESISTANCE FUJI PHOTO FILM CO., LTD. (JP) 1991-10-29 — — US disclosed
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