Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.53 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.39 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | BLM | P54132 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | KDM4C | Q9H3R0 | 2/20 | 0.33 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.33 |
| ▸ | KDM4A | O75164 | 1/20 | 0.33 |
| ▸ | PHF8 | Q9UPP1 | 1/20 | 0.33 |
| ▸ | KDM2A | Q9Y2K7 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16675422 | 1.00 | LMNA (0.53) | LMNATSHRTRPV1TRPA1TDP1 | |
| SCHEMBL16675428 | 1.00 | LMNA (0.53) | LMNATSHRTRPV1TRPA1TDP1 | |
| SCHEMBL195739 | 0.97 | LMNA (0.50) | LMNATSHRTRPV1TRPA1TDP1 | |
| SCHEMBL5712575 | 0.97 | LMNA (0.50) | LMNATSHRTRPV1TRPA1TDP1 | |
| SCHEMBL5712586 | 0.97 | LMNA (0.50) | LMNATSHRTRPV1TRPA1TDP1 | |
| SCHEMBL195982 | 0.97 | LMNA (0.50) | LMNATSHRTRPV1TRPA1TDP1 | |
| SCHEMBL5712576 | 0.97 | LMNA (0.50) | LMNATSHRTRPV1TRPA1TDP1 | |
| SCHEMBL5712567 | 0.97 | LMNA (0.50) | LMNATSHRTRPV1TRPA1TDP1 | |
| SCHEMBL5712563 | 0.97 | LMNA (0.50) | LMNATSHRTRPV1TRPA1TDP1 | |
| SCHEMBL5712644 | 0.97 | LMNA (0.50) | LMNATSHRTRPV1TRPA1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 234 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12578648-B2 | Rinsing liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2026-03-17 | — | — | US | disclosed |
| US-20250382724-A1 | SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING METHOD, AND SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING SYSTEM | TOKYO OHKA KOGYO CO LTD (JP) | 2025-12-18 | — | — | US | disclosed |
| US-20250369155-A1 | PROCESSING METHOD FOR SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE, SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING SYSTEM, AND REPLENISHING LIQUID | TOKYO OHKA KOGYO CO LTD (JP) | 2025-12-04 | — | — | US | disclosed |
| EP-3435158-B1 | ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FOR PURIFYING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2025-11-19 | — | — | EP | disclosed |
| US-12386265-B2 | Pattern forming method and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2025-08-12 | — | — | US | disclosed |
| US-12306538-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2025-05-20 | — | — | US | disclosed |
| EP-4539105-A1 | SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING METHOD, AND SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING SYSTEM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-04-16 | — | — | EP | disclosed |
| EP-4539106-A1 | PROCESSING METHOD FOR SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE, SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING SYSTEM, AND REPLENISHING LIQUID | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-04-16 | — | — | EP | disclosed |
| US-20250000088-A1 | ANT CONTROL AGENT AND ANT CONTROL METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-01-02 | — | — | US | disclosed |
| EP-3689476-B1 | METHOD FOR FORMING MULTILAYER COATING FILM | KANSAI PAINT CO LTD (JP) | 2024-10-02 | — | — | EP | disclosed |
| WO-2010095763-A1 | ORGANIC SOLVENT DEVELOPMENT OR MULTIPLE DEVELOPMENT PATTERN-FORMING METHOD USING ELECTRON BEAMS OR EUV RAYS | FUJIFILM CORPORATION (JP) | 2010-08-26 | — | — | WO | disclosed |
| WO-2010061977-A2 | PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-06-03 | — | — | WO | disclosed |
| WO-2009123355-A2 | COOLING SENSATION AGENT COMPOSITION AND SENSORY STIMULATION AGENT COMPOSITION | TAKASAGO INTERNATIONAL CORPORATION (JP) | 2009-10-08 | — | — | WO | disclosed |
| US-20090240120-A1 | SYSTEMS AND METHODS FOR PROCESSING, TRANSMITTING AND DISPLAYING SENSOR DATA | DEXCOM, INC. (US) | 2009-09-24 | — | — | US | disclosed |
| US-20090240193-A1 | SYSTEMS AND METHODS FOR CUSTOMIZING DELIVERY OF SENSOR DATA | DEXCOM, INC. (US) | 2009-09-24 | — | — | US | disclosed |
| EP-0692021-B1 | MICROEMULSION AND EMULSION CLEANING COMPOSITIONS | DOW CHEMICAL CO (US) | 2002-05-15 | — | — | EP | disclosed |
| US-5811383-A | WATER, IONIC SURFACTANT, ORGANIC SOLVENT MIXTURES FOR DEGREASING METAL SURFACE; LOW VISCOSITY, LOW CONDUCTIVITY | THE DOW CHEMICAL COMPANY (US) | 1998-09-22 | — | — | US | disclosed |
| US-5597792-A | High water content, low viscosity, oil continuous microemulsions and emulsions, and their use in cleaning applications | THE DOW CHEMICAL COMPANY (US) | 1997-01-28 | — | — | US | disclosed |
| EP-0692021-A1 | MICROEMULSION AND EMULSION CLEANING COMPOSITIONS | THE DOW CHEMICAL COMPANY (US) | 1996-01-17 | — | — | EP | disclosed |
| WO-1994023012-A1 | MICROEMULSION AND EMULSION CLEANING COMPOSITIONS | THE DOW CHEMICAL COMPANY (US) | 1994-10-13 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12578648-B2 | Rinsing liquid and pattern forming method | ALKBH5, GABBR1, DNMT3B | LMNA 3933/4885TSHR 617/4885TRPV1 1595/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.