Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | ABL1 | P00519 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | RIN1 | Q13671 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 5/20 | 0.33 |
| ▸ | RAB9A | P51151 | 5/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.32 |
| ▸ | USP2 | O75604 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19601036 | 0.93 | ALDH1A1 (0.41) | ALDH1A1ABL1TSHRRIN1NPC1 | |
| SCHEMBL19601631 | 0.90 | MEN1 (0.37) | ALDH1A1NPC1RAB9AL3MBTL1NPSR1 | |
| SCHEMBL19601634 | 0.85 | ALDH1A1 (0.39) | ALDH1A1ABL1TSHRRIN1NPC1 | |
| SCHEMBL19601035 | 0.84 | ALDH1A1 (0.38) | ALDH1A1TSHRNPC1RAB9AL3MBTL1 | |
| SCHEMBL19601635 | 0.83 | MEN1 (0.33) | ALDH1A1MEN1KMT2A | |
| SCHEMBL26008770 | 0.82 | ALDH1A1 (0.37) | ALDH1A1ABL1TSHRRIN1NPC1 | |
| SCHEMBL27255640 | 0.81 | ALDH1A1 (0.38) | ALDH1A1ABL1TSHRRIN1NPC1 | |
| SCHEMBL25596679 | 0.78 | ALDH1A1 (0.36) | ALDH1A1NPC1RAB9AL3MBTL1MEN1 | |
| SCHEMBL19601040 | 0.77 | ALDH1A1 (0.43) | ALDH1A1ABL1TSHRRIN1NPC1 | |
| SCHEMBL17548712 | 0.77 | ALDH1A1 (0.39) | ALDH1A1ABL1TSHRRIN1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170329224-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-16 | — | — | US | disclosed |