SCHEMBL19601635

SCHEMBL19601635

CC(C)(C)C(=O)OCC12CC3CC(C1)C1(OCC(CCC(=O)C45CC6CC(C4)C(=O)C(C6)C5)(COC(=O)C45CC6CC(C4)C(=O)C(C6)C5)CO1)C(C3)C2

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.33
ALDH1A1 P00352 1/20 0.33
KMT2A Q03164 1/20 0.33
ATM Q13315 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19601037 0.93 ALDH1A1 (0.34) MEN1ALDH1A1KMT2AATM
SCHEMBL25596679 0.92 ALDH1A1 (0.36) MEN1ALDH1A1KMT2AATM
SCHEMBL19601631 0.92 MEN1 (0.37) MEN1ALDH1A1KMT2AATM
SCHEMBL19601636 0.86 MEN1 (0.33) MEN1ALDH1A1KMT2AATM
SCHEMBL25494644 0.85 TSHR (0.33) MEN1ALDH1A1KMT2AATM
SCHEMBL19601035 0.84 ALDH1A1 (0.38) MEN1ALDH1A1KMT2AATM
SCHEMBL19601632 0.83 ALDH1A1 (0.37) MEN1ALDH1A1KMT2A
SCHEMBL26008768 0.82 MEN1 (0.31) MEN1ALDH1A1KMT2AATM
SCHEMBL27255639 0.81 MEN1 (0.31) MEN1ALDH1A1KMT2AATM
SCHEMBL19601043 0.81 ALDH1A1 (0.32) MEN1ALDH1A1KMT2AATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170329224-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN AND PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-11-16 US disclosed