Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PSEN1 | P49768 | 3/20 | 0.46 |
| ▸ | PSEN2 | P49810 | 3/20 | 0.46 |
| ▸ | APH1B | Q8WW43 | 3/20 | 0.46 |
| ▸ | NCSTN | Q92542 | 3/20 | 0.46 |
| ▸ | APH1A | Q96BI3 | 3/20 | 0.46 |
| ▸ | PSENEN | Q9NZ42 | 3/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | ESR1 | P03372 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 3/20 | 0.39 |
| ▸ | POLB | P06746 | 3/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12076456 | 0.92 | ALDH1A1 (0.55) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL7123509 | 0.86 | ALDH1A1 (0.41) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL197925 | 0.85 | ALDH1A1 (0.45) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL7194791 | 0.85 | SMN1; SMN2 (0.49) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL5274392 | 0.83 | SMN1; SMN2 (0.67) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL197953 | 0.83 | SMN1; SMN2 (0.53) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL3822834 | 0.83 | PSEN1 (0.54) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL196285 | 0.82 | ELANE (0.54) | SMN1; SMN2ALDH1A1ESR1CYP3A4ESR2 | |
| SCHEMBL7122766 | 0.81 | ESR1 (0.65) | ALDH1A1ESR1CYP3A4ESR2CYP2C19 | |
| SCHEMBL28902623 | 0.81 | POLB (0.41) | SMN1; SMN2ALDH1A1ESR1CYP3A4ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 230 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1308782-B1 | Chemically amplified positive resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-09-05 | — | — | EP | claimed |
| US-6660447-B2 | Copolymers of fluorinated vinyl phenol units and acrylonitrile units has high transmittance to VUV radiation | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-09 | — | — | US | claimed |
| EP-2955576-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-07-22 | — | — | EP | disclosed |
| US-9519217-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-13 | — | — | US | disclosed |
| EP-2955576-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-12-16 | — | — | EP | disclosed |
| US-20150355543-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-10 | — | — | US | disclosed |
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| US-8980525-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-17 | — | — | US | disclosed |
| US-8968982-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| EP-1204001-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-09-11 | — | — | EP | disclosed |
| US-20010031421-A1 | Chemical amplification resist compositions | SHIN-ETSU CHEMICAL CO., LTD. OF (JP) | 2001-10-18 | — | — | US | disclosed |
| US-20010018162-A1 | Novel polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1126322-A2 | Fluorine-containing polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-22 | — | — | EP | disclosed |
| US-20010010890-A1 | Polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-02 | — | — | US | disclosed |
| EP-1117003-A1 | Chemical amplification type resist composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2001-07-18 | — | — | EP | disclosed |
| US-20010003772-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICDL CO., LTD. OF (JP) | 2001-06-14 | — | — | US | disclosed |
| EP-1077391-A1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |
| EP-0646568-B1 | Tertiary butyl 4,4-bis(4'-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same | SHINETSU CHEMICAL CO (JP) | 1998-12-23 | — | — | EP | disclosed |
| EP-0646568-A2 | Tertiary butyl 4,4-bis(4'-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-04-05 | — | — | EP | disclosed |