Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.53 |
| ▸ | PSEN1 | P49768 | 3/20 | 0.51 |
| ▸ | PSEN2 | P49810 | 3/20 | 0.51 |
| ▸ | APH1B | Q8WW43 | 3/20 | 0.51 |
| ▸ | NCSTN | Q92542 | 3/20 | 0.51 |
| ▸ | APH1A | Q96BI3 | 3/20 | 0.51 |
| ▸ | PSENEN | Q9NZ42 | 3/20 | 0.51 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.46 |
| ▸ | POLB | P06746 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 4/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.44 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | HTT | P42858 | 2/20 | 0.44 |
| ▸ | TP53 | P04637 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5556288 | 0.95 | PSEN1 (0.51) | SMN1; SMN2PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL5274392 | 0.90 | SMN1; SMN2 (0.67) | SMN1; SMN2PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL3822834 | 0.90 | PSEN1 (0.54) | SMN1; SMN2PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL21819637 | 0.87 | PSEN1 (0.62) | SMN1; SMN2PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL14652405 | 0.86 | MAPT (0.53) | SMN1; SMN2PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL12995868 | 0.85 | SMN1; SMN2 (0.49) | SMN1; SMN2PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL7194791 | 0.85 | SMN1; SMN2 (0.49) | SMN1; SMN2PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL5515918 | 0.84 | PSEN1 (0.49) | SMN1; SMN2PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL17652044 | 0.84 | SMN1; SMN2 (0.64) | SMN1; SMN2PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL6654340 | 0.84 | LMNA (0.58) | SMN1; SMN2PSEN1PSEN2APH1BNCSTN |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 229 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1308782-B1 | Chemically amplified positive resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-09-05 | — | — | EP | claimed |
| US-6660447-B2 | Copolymers of fluorinated vinyl phenol units and acrylonitrile units has high transmittance to VUV radiation | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-09 | — | — | US | claimed |
| EP-2955576-B1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-07-22 | — | — | EP | disclosed |
| US-9519217-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-13 | — | — | US | disclosed |
| EP-2955576-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-12-16 | — | — | EP | disclosed |
| US-20150355543-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-10 | — | — | US | disclosed |
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| US-8980525-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-17 | — | — | US | disclosed |
| US-8968982-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| EP-1204001-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-09-11 | — | — | EP | disclosed |
| EP-1126322-A2 | Fluorine-containing polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-22 | — | — | EP | disclosed |
| US-20010010890-A1 | Polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-02 | — | — | US | disclosed |
| EP-1117003-A1 | Chemical amplification type resist composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2001-07-18 | — | — | EP | disclosed |
| US-20010003772-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICDL CO., LTD. OF (JP) | 2001-06-14 | — | — | US | disclosed |
| EP-1077391-A1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |
| EP-0675410-B1 | Resist composition for deep ultraviolet light | WAKO PURE CHEM IND LTD (JP) | 1999-08-04 | — | — | EP | disclosed |
| US-5780206-A | USING AN ANTHRACENE DERIVATIVE AS AN ABSORBER ON HIGHLY REFLECTIVE SURFACES; ALKALI-SOLUBLE POLYMERS; GENERATION OF ACID CATALYSTS; FINE PATTERNS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1998-07-14 | — | — | US | disclosed |
| US-5695910-A | RESIN BECOMES ALKALI SOLUBLE BY ELIMINATING PROTECTIVE GROUPS BY ACTION OF IN SITU GENERATED ACID | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1997-12-09 | — | — | US | disclosed |
| EP-0675410-A1 | Resist composition for deep ultraviolet light | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1995-10-04 | — | — | EP | disclosed |