Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 9/20 | 0.45 |
| ▸ | ACHE | P22303 | 3/20 | 0.43 |
| ▸ | PPARG | P37231 | 1/20 | 0.41 |
| ▸ | PPARA | Q07869 | 1/20 | 0.41 |
| ▸ | MMP1 | P03956 | 2/20 | 0.40 |
| ▸ | MMP2 | P08253 | 2/20 | 0.40 |
| ▸ | MMP9 | P14780 | 2/20 | 0.40 |
| ▸ | MMP12 | P39900 | 2/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.40 |
| ▸ | PRTN3 | P24158 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12945174 | 0.81 | MMP1 (0.57) | MMP1MMP2MMP9MMP12CYP1A2 | |
| SCHEMBL24943633 | 0.81 | ELANE (0.45) | ELANEMMP1MMP2MMP9MMP12 | |
| SCHEMBL5936393 | 0.80 | ALDH1A1 (0.50) | ACHECYP3A4CYP1A2CYP2D6CYP2C19 | |
| SCHEMBL1035696 | 0.79 | ELANE (0.53) | ELANEACHECYP3A4 | |
| SCHEMBL29729966 | 0.78 | MMP1 (0.56) | MMP1MMP2MMP9MMP12 | |
| SCHEMBL1033055 | 0.78 | ELANE (0.51) | ELANEACHECYP3A4 | |
| Phosphonic Acid SCHEMBL9638832 | 0.78 | ELANE (0.45) | ELANEACHECYP3A4 | |
| SCHEMBL24944144 | 0.77 | MAOB (0.43) | ELANEPPARGPPARA | |
| SCHEMBL13686647 | 0.77 | MMP1 (0.56) | MMP1MMP2MMP9MMP12CYP1A2 | |
| SCHEMBL18458153 | 0.76 | ELANE (0.46) | ELANEACHECYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9829792-B2 | Monomer, polymer, positive resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-11-28 | — | — | US | disclosed |