Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB | P27338 | 1/20 | 0.36 |
| ▸ | MAOA | P21397 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA7 | P43166 | 1/20 | 0.33 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.33 |
| ▸ | LTA4H | P09960 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 4/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.33 |
| ▸ | HTR1A | P08908 | 1/20 | 0.32 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.32 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.32 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5426532 | 0.84 | MAOB (0.38) | MAOBMAOACA12CA1CA2 | |
| SCHEMBL10451330 | 0.83 | MAOB (0.40) | MAOBMAOACA12CA1CA2 | |
| SCHEMBL1965473 | 0.78 | DPP4 (0.37) | MAOBMAOALTA4HTSHRCYP1A2 | |
| SCHEMBL1966244 | 0.77 | MAOB (0.40) | MAOBMAOACA12CA1CA2 | |
| SCHEMBL8954705 | 0.76 | MAOB (0.39) | MAOBMAOACA12CA1CA2 | |
| SCHEMBL1964819 | 0.75 | SMN1; SMN2 (0.39) | CA1CA2TSHRMAPTPOLB | |
| SCHEMBL7776603 | 0.75 | LTA4H (0.52) | MAOBMAOACA12CA1CA2 | |
| SCHEMBL6403569 | 0.75 | RIPK1 (0.40) | LTA4HTSHRHTR1ASLC6A2SLC6A4 | |
| SCHEMBL6004099 | 0.74 | SMN1; SMN2 (0.38) | TSHRMAPTPOLBCYP3A4KMT2A | |
| SCHEMBL9617287 | 0.74 | CD44 (0.38) | TSHRMAPTPOLBCYP3A4KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-1095155-A | — | — | None | — | — | JP | disclosed |
| CN-111830786-B | Photosensitive resin composition containing silane coupling agent | 波米科技有限公司 | 2023-05-23 | — | — | CN | disclosed |
| CN-112939915-A | Diamine monomer for photosensitive resin, polyimide precursor, photosensitive resin composition, and use thereof | 武汉柔显科技股份有限公司 | 2021-06-11 | — | — | CN | disclosed |
| EP-1296540-B1 | DISPLAY | TORAY INDUSTRIES (JP) | 2019-10-16 | — | — | EP | disclosed |
| US-8409325-B2 | Asymmetric gas separation membrane and process for gas separation | UBE INDUSTRIES, LTD. (JP) | 2013-04-02 | — | — | US | disclosed |
| US-20110232484-A1 | ASYMMETRIC GAS SEPARATION MEMBRANE AND PROCESS FOR GAS SEPARATION | UBE INDUSTRIES, LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| EP-2335815-A1 | ASYMMETRIC GAS SEPARATION MEMBRANE, AND GAS SEPARATION METHOD | Ube Industries, Ltd. (JP) | 2011-06-22 | — | — | EP | disclosed |
| US-6887643-B2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2005-05-03 | — | — | US | disclosed |
| EP-0878740-B1 | Radiation sensitive polymer composition | TORAY INDUSTRIES (JP) | 2004-11-10 | — | — | EP | disclosed |
| US-20040053156-A1 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2004-03-18 | — | — | US | disclosed |
| US-5851616-A | Adhesive tape for electronic parts and liquid adhesive | TOMOEGAWA PAPER CO., LTD. (JP) | 1998-12-22 | — | — | US | disclosed |
| EP-0878740-A1 | Radiation sensitive polymer composition | TORAY INDUSTRIES, INC. (JP) | 1998-11-18 | — | — | EP | disclosed |
| US-5725948-A | POLYIMIDE FROM A BISMALEIMIDE AND A DIAMINE | TOMOEGAWA PAPER CO., LTD. (JP) | 1998-03-10 | — | — | US | disclosed |
| US-5696235-A | CONTAINING A BISMALEIMIDE; HEAT RESISTANCE, PROCESSABILITY; SOLUBLE IN VARIOUS ORGANIC SOLVENTS | TOMOEGAWA PAPER CO., LTD. (JP) | 1997-12-09 | — | — | US | disclosed |
| US-5663287-A | SOLUBLE IN ORGANIC SOLVENTS AND EXCELS IN HEAT RESISTANCE | TOMOEGAWA PAPER CO., LTD. (JP) | 1997-09-02 | — | — | US | disclosed |
| US-5608013-A | Polyimides and thermosetting resin compositions containing the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1997-03-04 | — | — | US | disclosed |
| EP-0729996-A1 | Polyimide and process for producing the same | TOMOEGAWA PAPER CO. LTD. (JP) | 1996-09-04 | — | — | EP | disclosed |
| EP-0456515-B1 | Polyimides and thermosetting resin compositions containing the same | HITACHI CHEMICAL CO LTD (JP) | 1995-11-08 | — | — | EP | disclosed |
| EP-0456515-A1 | Polyimides and thermosetting resin compositions containing the same | Hitachi Chemical Co., Ltd. (JP) | 1991-11-13 | — | — | EP | disclosed |
| JP-H0195155-A | POLYIMIDE RESIN COMPOSITION | MITSUBISHI KASEI CORP | 1989-04-13 | — | — | JP | disclosed |