Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 13/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | PKM | P14618 | 3/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 2/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5833511 | 0.87 | POLB (0.33) | KDM4ETDP1POLB | |
| SCHEMBL4271968 | 0.82 | KDM4E (0.37) | KDM4EALDH1A1TDP1LMNAPKM | |
| SCHEMBL13346658 | 0.80 | KDM4E (0.41) | KDM4EALDH1A1TDP1LMNAPKM | |
| SCHEMBL15803193 | 0.78 | KDM4E (0.43) | KDM4EALDH1A1TDP1LMNATSHR | |
| SCHEMBL12357865 | 0.78 | KDM4E (0.43) | KDM4EALDH1A1TDP1LMNATSHR | |
| SCHEMBL15466780 | 0.77 | KDM4E (0.46) | KDM4EALDH1A1TDP1LMNATSHR | |
| SCHEMBL6550594 | 0.77 | KDM4E (0.37) | KDM4EALDH1A1TDP1LMNAPKM | |
| SCHEMBL6548933 | 0.76 | KDM4E (0.36) | KDM4EALDH1A1TDP1PKMTSHR | |
| SCHEMBL6549460 | 0.76 | KDM4E (0.36) | KDM4EALDH1A1TDP1PKMTSHR | |
| SCHEMBL6550648 | 0.76 | EPHX2 (0.38) | KDM4EALDH1A1TDP1PKMMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1660561-B1 | PHOTOSENSITIVE SILSESQUIOXANE RESIN | DOW CORNING (US) | 2014-02-12 | — | — | EP | claimed |
| US-8470944-B2 | Polynorbornene pervaporation membrane films, preparation and use thereof | PROMERUS, LLC (US) | 2013-06-25 | — | — | US | claimed |
| US-20120283404-A1 | Polynorbornene Pervaporation Membrane Films, Preparation and Use Thereof | PROMERUS LLC (US) | 2012-11-08 | — | — | US | claimed |
| US-7625687-B2 | Silsesquioxane resin | DOW CORNING CORPORATION (US) | 2009-12-01 | — | — | US | claimed |
| US-20070281242-A1 | Silsesquioxane Resin | DOW SILICONES CORPORATION | 2007-12-06 | — | — | US | claimed |
| EP-1660561-A2 | PHOTOSENSITIVE SILSESQUIOXANE RESIN | Dow Corning Corporation (US) | 2006-05-31 | — | — | EP | claimed |
| WO-2005007747-A2 | PHOTOSENSITIVE SILSESQUIOXANE RESIN | DOW CORNING CORPORATION (US) | 2005-01-27 | — | — | WO | claimed |
| US-8678203-B2 | Polynorbornene pervaporation membrane films, preparation and use thereof | PROMERUS, LLC (US) | 2014-03-25 | — | — | US | disclosed |
| EP-1660561-B1 | PHOTOSENSITIVE SILSESQUIOXANE RESIN | DOW CORNING (US) | 2014-02-12 | — | — | EP | disclosed |
| US-8609574-B2 | In situ olefin polymerization catalyst system | PROMERUS LLC (US) | 2013-12-17 | — | — | US | disclosed |
| US-20130292872-A1 | Polynorbornene Pervaporation Membrane Films, Preparation and Use Thereof | PROMERUS, LLC | 2013-11-07 | — | — | US | disclosed |
| US-8524439-B2 | Silsesquioxane resin systems with base additives bearing electron-attracting functionalities | DOW CORNING CORPORATION (US) | 2013-09-03 | — | — | US | disclosed |
| US-8470944-B2 | Polynorbornene pervaporation membrane films, preparation and use thereof | PROMERUS, LLC (US) | 2013-06-25 | — | — | US | disclosed |
| WO-2005007747-A2 | PHOTOSENSITIVE SILSESQUIOXANE RESIN | DOW CORNING CORPORATION (US) | 2005-01-27 | — | — | WO | disclosed |
| EP-1167349-B1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2004-12-01 | — | — | EP | disclosed |
| US-6818376-B2 | OVERCOATING SEMICONDUCTOR SUBSTRATE WITH PHOTOSENSITIVE POLYMER; EXPOSURE TO RADIATION IN PRESENCE OF ACID GENERATOR | HYNIX SEMICONDUCTOR INC. (KR) | 2004-11-16 | — | — | US | disclosed |
| US-6548220-B2 | Containing acid generator | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-04-15 | — | — | US | disclosed |
| US-6403281-B1 | ALKYLENE GLYCOL DI(METH)ACRYLATE OR ALKYLENE GLYCOL DI(2-NORBORNENE-5-CARBOXYLATE) CROSSLINKING MONOMERS; DURABILITY, CONTRAST, RESOLUTION, ADHESION; PHOTOLITHOGRAPHY; SEMICONDUCTORS | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-06-11 | — | — | US | disclosed |
| US-20020015913-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-07 | — | — | US | disclosed |
| EP-1167349-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-02 | — | — | EP | disclosed |