SCHEMBL196749

SCHEMBL196749

C=Cc1ccc(C)c(O)c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 2/20 0.52
TSHR P16473 1/20 0.46
CASP1 P29466 1/20 0.46
TP53 P04637 2/20 0.45
TDP1 Q9NUW8 2/20 0.45
ALDH1A1 P00352 2/20 0.43
PTGS1 P23219 2/20 0.43
ACHE P22303 1/20 0.43
CACNA1C Q13936 1/20 0.43
TUBB1 Q9H4B7 2/20 0.42
ESR1 P03372 1/20 0.41
ESR2 Q92731 1/20 0.41
KDM4E B2RXH2 2/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2D6 P10635 1/20 0.41
MAPT P10636 1/20 0.41
G6PD P11413 1/20 0.41
CYP2C9 P11712 1/20 0.41
PKM P14618 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29505021 1.00 TRPA1 (0.52) TRPA1TSHRCASP1TP53TDP1
SCHEMBL197464 0.82 TRPA1 (0.57) TRPA1TP53TDP1ALDH1A1PTGS1
SCHEMBL30214361 0.82 TRPA1 (0.57) TRPA1TP53TDP1ALDH1A1PTGS1
SCHEMBL293173 0.78 ALDH1A1 (0.50) TRPA1TSHRTP53TDP1ALDH1A1
SCHEMBL29407001 0.78 ALDH1A1 (0.50) TRPA1TSHRTP53TDP1ALDH1A1
SCHEMBL29502822 0.78 TRPA1 (0.52) TRPA1TSHRCASP1TP53TDP1
SCHEMBL170797 0.78 LCK (0.64) TRPA1TSHRCASP1TP53TDP1
SCHEMBL29403669 0.78 LCK (0.64) TRPA1TSHRCASP1TP53TDP1
SCHEMBL11856367 0.77 TSHR (0.46) TRPA1TSHRCASP1TP53TDP1
SCHEMBL111227 0.77 KDM4E (0.64) TRPA1TSHRCASP1TDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 347 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7258962-B2 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2007-08-21 US claimed
US-20050244747-A1 Positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-03 US claimed
US-4182803-A WITH REACTIVE PHENOLIC GROUP SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1980-01-08 US claimed
US-4039630-A Elastomer SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1977-08-02 US claimed
US-3993714-A Elastomer SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1976-11-23 US claimed
US-20260147277-A1 TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE FUJIFILM CORPORATION (JP) 2026-05-28 US disclosed
US-20250340695-A1 COMPOSITION, TRANSFER FILM, METHOD FOR MANUFACTURING LAMINATE, LAMINATE, AND CURED FILM FUJIFILM CORP (JP) 2025-11-06 US disclosed
US-12447725-B2 Curable resin multilayer body, dry film, cured product and electronic component TAIYO HOLDINGS CO., LTD. (JP) 2025-10-21 US disclosed
US-20250299889-A1 SOLID ELECTROLYTIC CAPACITOR ELEMENT AND SOLID ELECTROLYTIC CAPACITOR PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2025-09-25 US disclosed
WO-2025047730-A1 TRANSFER FILM, PATTERN FORMATION METHOD, LAMINATE, SEMICONDUCTOR PACKAGE 富士フイルム株式会社 2025-03-06 WO disclosed
WO-2025028374-A1 COMPOSITION, TRANSFER FILM, METHOD FOR PRODUCING LAMINATE, LAMINATE, AND SEMICONDUCTOR PACKAGE 富士フイルム株式会社 2025-02-06 WO disclosed
WO-2025004927-A1 PHENOL COMPOUND, POLYPHENYLENE ETHER, CURABLE COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND COMPOUND 太陽ホールディングス株式会社 2025-01-02 WO disclosed
EP-0525627-A1 Oligomeric compounds containing acid-cleavable protective groups and positive groups and positive-working, radiation-sensitive composition prepared using these cmpounds HOECHST AKTIENGESELLSCHAFT (DE) 1993-02-03 EP disclosed
EP-0525626-A1 Compounds containing acid-cleavable protective groups and positive-working radiation-sensitive compositions prepared using these compounds HOECHST AKTIENGESELLSCHAFT (DE) 1993-02-03 EP disclosed
EP-0510449-A2 Acid-cleavable compounds, positive-working radiation-sensitive composition containing the same and radiation-sensitive recording material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1992-10-28 EP disclosed
EP-0510444-A1 Acid-cleavable radiation-sensitive compounds, radiation-sensitive composition containing the same and radiation-sensitive recording material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1992-10-28 EP disclosed
EP-0510445-A1 Acid-cleavable radiation-sensitive compounds, radiation-sensitive composition containing the same and radiation-sensitive recording material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1992-10-28 EP disclosed
US-4182803-A WITH REACTIVE PHENOLIC GROUP SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1980-01-08 US disclosed
US-4039630-A Elastomer SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1977-08-02 US disclosed
US-3993714-A Elastomer SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1976-11-23 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260147277-A1 TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE LCP1, PCNA, FDFT1 TRPA1 2854/4885TSHR 3691/4885CASP1 3466/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.