Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | HCAR2 | Q8TDS4 | 3/20 | 0.32 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.32 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5875138 | 1.00 | KDM4E (0.32) | KDM4EMAPTHPGDHSD17B10HCAR2 | |
| SCHEMBL7212969 | 0.81 | THRB (0.35) | HSD17B10 | |
| Hydrochloric Acid SCHEMBL9656022 | 0.79 | THRB (0.34) | HSD17B10 | |
| SCHEMBL5874788 | 0.76 | — | — | |
| SCHEMBL5875157 | 0.76 | — | — | |
| SCHEMBL936386 | 0.72 | ALDH1A1 (0.32) | — | |
| SCHEMBL1505860 | 0.72 | MEN1 (0.30) | — | |
| SCHEMBL175986 | 0.72 | ALDH1A1 (0.32) | KDM4EHPGDHSD17B10 | |
| SCHEMBL5874277 | 0.70 | KMT2A (0.30) | — | |
| Ammonia Solution, Strong SCHEMBL5844205 | 0.70 | ALDH1A1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2336256-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM WITH ONIUM GROUP | Nissan Chemical Industries, Ltd. (JP) | 2011-06-22 | — | — | EP | disclosed |
| US-7166362-B2 | Film-forming composition, production process therefor, and porous insulating film | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-23 | — | — | US | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20050074556-A1 | Film-forming composition, production process therefor, and porous insulating film | FUJI PHOTO FILM CO., LTD. | 2005-04-07 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |