SCHEMBL1968528

SCHEMBL1968528

O=[C]C=CCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8375627 1.00
SCHEMBL570226 0.75
SCHEMBL891838 0.72
SCHEMBL8468504 0.72
SCHEMBL28286901 0.71
SCHEMBL6007869 0.68 GPR84 (0.32)
SCHEMBL6005092 0.68 GPR84 (0.32)
SCHEMBL8613716 0.68 GPR84 (0.32)
SCHEMBL6008003 0.68 GPR84 (0.32)
SCHEMBL7510460 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109718372-A Carrier and preparation method thereof is immunized in nanoscale emulsion for schneiderian membrance 财团法人卫生研究院 2019-05-07 CN claimed
WO-2012177943-A1 MICROORGANISMS FOR PRODUCING 1,4-BUTANEDIOL AND METHODS RELATED THERETO GENOMATICA, INC. (US) 2012-12-27 WO claimed
EP-2334800-A2 MICROORGANISMS FOR THE PRODUCTION OF 1,4-BUTANEDIOL Genomatica, Inc. (US) 2011-06-22 EP claimed
WO-2010030711-A2 MICROORGANISMS FOR THE PRODUCTION OF 1,4-BUTANEDIOL GENOMATICA, INC. (US) 2010-03-18 WO claimed
CN-115702171-A Emulsion of di-sec-butyl peroxydicarbonate 阿科玛法国公司 2023-02-14 CN disclosed
CN-110537146-A Photosensitive resin composition NISSAN CHEMICAL CORP 2019-12-03 CN disclosed
CN-110023443-A resin composition for adhesive and adhesive sheet 三菱化学株式会社 2019-07-16 CN disclosed
CN-109248144-A A kind of transparent liplid emulsions 北京泰德制药股份有限公司 2019-01-22 CN disclosed
CN-108700734-A FLEXIBLE COLOR FILTER 东友精细化工有限公司 2018-10-23 CN disclosed
CN-106950800-A Photosensitive composition JNC株式会社 2017-07-14 CN disclosed
US-9634161-B2 Nanoscale precursors for synthesis of Fe2(Si,Ge)(S,Se)4 crystalline particles and layers DELAWARE STATE UNIVERSITY (US) 2017-04-25 US disclosed
US-9175297-B2 Microorganisms for the production of 1,4-Butanediol GENOMATICA, INC. (US) 2015-11-03 US disclosed
CN-1751269-A Halogenated oxime derivatives and their use as latent acids CIBA SC HOLDING AG (CH) 2006-03-22 CN disclosed
CN-1662853-A Onium salts and their use as latent acids CIBA SC HOLDING AG (CH) 2005-08-31 CN disclosed
CN-1213343-C Iodonium salt used as potential acid provider CIBA SPECIATY CHEMICALS HOLDIN (CH) 2005-08-03 CN disclosed
CN-1306224-A Iodonium salt used as potential acid provider CIBA SPECIATY CHEMICALS HOLDIN (CH) 2001-08-01 CN disclosed
WO-1996000253-A1 A SURFACE ACTIVE COMPOSITION CONTAINING AN ACETAL OR KETAL ADDUCT THE DOW CHEMICAL COMPANY (US) 1996-01-04 WO disclosed
US-4131465-A Radiation sensitive polymeric o-nitrophenyl acetals and element EASTMAN KODAK COMPANY (US) 1978-12-26 US disclosed
US-4086210-A Radiation sensitive polymeric o-nitrophenyl acetals EASTMAN KODAK COMPANY (US) 1978-04-25 US disclosed
US-3954886-A Alkali stable polyoxyethylene acetal surfactants BASF WYANDOTTE CORPORATION (US) 1976-05-04 US disclosed