SCHEMBL570226

SCHEMBL570226

O=[C]C=CCCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28286901 0.83
SCHEMBL8468504 0.81
SCHEMBL6005092 0.79 GPR84 (0.32)
SCHEMBL8613716 0.79 GPR84 (0.32)
SCHEMBL6668861 0.79 GPR84 (0.32)
SCHEMBL6008003 0.79 GPR84 (0.32)
SCHEMBL6007869 0.79 GPR84 (0.32)
SCHEMBL1968528 0.75
SCHEMBL8375627 0.75
SCHEMBL7927909 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109303879-B Traditional Chinese medicine emplastrum for treating eczema and preparation method thereof 杭州仁德医药有限公司 2021-07-06 CN claimed
CN-107892372-B Water-soluble five-membered polymer molecular brush dye capturing settling agent, and preparation method and application thereof 顺德职业技术学院 2020-09-01 CN claimed
CN-111281926-A Breathable and antibacterial inflammation-diminishing and pain-relieving ointment 杭州仁德医药有限公司 2020-06-16 CN claimed
CN-107879453-A New chelant type heavy metal chelating agent and its synthetic method and its application 顺德职业技术学院 2018-04-06 CN claimed
CN-102786839-A Glass protecting ink and preparation method thereof FOSHAN 3Q ELECTRONIC MATERIALS CO LTD 2012-11-21 CN claimed
CN-118270927-A Preparation method and application of sewage treatment unit based on 3D printing 国网河北省电力有限公司超高压分公司 2024-07-02 CN disclosed
CN-109303879-B Traditional Chinese medicine emplastrum for treating eczema and preparation method thereof 杭州仁德医药有限公司 2021-07-06 CN disclosed
EP-3764995-A1 TRANSDERMAL THERAPEUTIC SYSTEM FOR THE TRANSDERMAL ADMINISTRATION OF BUPRENORPHINE COMPRISING A SILICONE ACRYLIC HYBRID POLYMER LTS Lohmann Therapie-Systeme AG (DE) 2021-01-20 EP disclosed
WO-2020196652-A1 SOLID STATE CONTACT MEDIUM TDK株式会社 2020-10-01 WO disclosed
CN-111281926-A Breathable and antibacterial inflammation-diminishing and pain-relieving ointment 杭州仁德医药有限公司 2020-06-16 CN disclosed
CN-110537146-A Photosensitive resin composition NISSAN CHEMICAL CORP 2019-12-03 CN disclosed
CN-110484170-A Adhesive composition, adhesive phase and bonding sheet NITTO DENKO CORP 2019-11-22 CN disclosed
CN-104641294-A Negative photosensitive resin composition NISSAN CHEMICAL IND LTD 2015-05-20 CN disclosed
WO-2014152434-A2 MICROORGANISMS AND METHODS FOR PRODUCING BUTADIENE AND RELATED COMPOUNDS BY FORMATE ASSIMILATION GENOMATICA, INC. (US) 2014-09-25 WO disclosed
EP-2744906-A1 MICROORGANISMS AND METHODS FOR PRODUCING 2,4-PENTADIENOATE, BUTADIENE, PROPYLENE, 1,3-BUTANEDIOL AND RELATED ALCOHOLS Genomatica, Inc. (US) 2014-06-25 EP disclosed
WO-2013028519-A1 MICROORGANISMS AND METHODS FOR PRODUCING 2,4-PENTADIENOATE, BUTADIENE, PROPYLENE, 1,3-BUTANEDIOL AND RELATED ALCOHOLS GENOMATICA, INC. (US) 2013-02-28 WO disclosed
CN-102786839-A Glass protecting ink and preparation method thereof FOSHAN 3Q ELECTRONIC MATERIALS CO LTD 2012-11-21 CN disclosed
CN-102782579-A Negative photosensitive resin composition, interlayer insulating film and method for forming the same HITACHI CHEMICAL CO LTD 2012-11-14 CN disclosed
CN-102762657-A Radiation curable resin composition, and fingerprint-resistant resin composition containing same POSCO 2012-10-31 CN disclosed
WO-2012018624-A2 MICROORGANISMS AND METHODS FOR THE BIOSYNTHESIS OF AROMATICS, 2,4-PENTADIENOATE AND 1,3-BUTADIENE GENOMATICA, INC. (US) 2012-02-09 WO disclosed