⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Vinyl Ether SCHEMBL1226757 | 0.86 | — | — | |
| Vinyl Ether SCHEMBL9622539 | 0.80 | — | — | |
| Vinyl Ether SCHEMBL18422412 | 0.80 | — | — | |
| Acrylic Acid SCHEMBL273353 | 0.80 | LMNA (0.67) | — | |
| Acrylic Acid SCHEMBL27898022 | 0.79 | LMNA (0.56) | — | |
| Vinyl Ether SCHEMBL10354772 | 0.79 | — | — | |
| Fumaric Acid SCHEMBL2342320 | 0.78 | TSHR (0.56) | — | |
| Fumaric Acid SCHEMBL4626269 | 0.78 | TSHR (0.56) | — | |
| Maleic Acid SCHEMBL4626935 | 0.78 | TSHR (0.56) | — | |
| Vinyl Ether SCHEMBL1023190 | 0.78 | LMNA (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8088564-B2 | Base soluble polymers for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2012-01-03 | — | — | US | disclosed |
| EP-2004725-B1 | BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA (US) | 2009-10-07 | — | — | EP | disclosed |
| US-7550249-B2 | Base soluble polymers for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-06-23 | — | — | US | disclosed |
| US-20090061347-A1 | BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS | MERCK PATENT GMBH (DE) | 2009-03-05 | — | — | US | disclosed |
| EP-2004725-A1 | BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2008-12-24 | — | — | EP | disclosed |
| WO-2007105082-A1 | BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-09-20 | — | — | WO | disclosed |
| US-20070212638-A1 | Base soluble polymers for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2007-09-13 | — | — | US | disclosed |
| EP-0643760-B1 | POLY(VINYL ETHER) AMINOCARBAMATES AND FUEL COMPOSITIONS CONTAINING THE SAME | CHEVRON CHEM CO (US) | 1998-09-23 | — | — | EP | disclosed |
| EP-0643760-A4 | POLY(VINYL ETHER) AMINOCARBAMATES AND FUEL COMPOSITIONS CONTAINING THE SAME. | CHEVRON CHEM CO (US) | 1995-09-13 | — | — | EP | disclosed |
| EP-0643760-A1 | POLY(VINYL ETHER) AMINOCARBAMATES AND FUEL COMPOSITIONS CONTAINING THE SAME | CHEVRON CHEMICAL COMPANY (US) | 1995-03-22 | — | — | EP | disclosed |
| WO-1994022986-A1 | POLY(VINYL ETHER) AMINOCARBAMATES AND FUEL COMPOSITIONS CONTAINING THE SAME | CHEVRON RESEARCH AND TECHNOLOGY COMPANY, A DIVISION OF CHEVRON U.S.A. INC. (US) | 1994-10-13 | — | — | WO | disclosed |
| US-5306314-A | Fuel additive; antideposit agents | CHEVRON RESEARCH AND TECHNOLOGY COMPANY (US) | 1994-04-26 | — | — | US | disclosed |