Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 3/20 | 0.78 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.78 |
| ▸ | MEN1 | O00255 | 1/20 | 0.78 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.78 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.78 |
| ▸ | USP2 | O75604 | 1/20 | 0.78 |
| ▸ | GPBAR1 | Q8TDU6 | 9/20 | 0.73 |
| ▸ | PDE3A | Q14432 | 1/20 | 0.73 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.73 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.71 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.71 |
| ▸ | CA1 | P00915 | 2/20 | 0.69 |
| ▸ | CA2 | P00918 | 2/20 | 0.69 |
| ▸ | LMNA | P02545 | 1/20 | 0.68 |
| ▸ | CYP8B1 | Q9UNU6 | 1/20 | 0.67 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.66 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14871096 | 1.00 | CYP3A4 (0.78) | CYP3A4KMT2AMEN1SLCO1B3SLCO1B1 | |
| SCHEMBL5440315 | 0.97 | CYP3A4 (0.73) | CYP3A4KMT2AMEN1SLCO1B3SLCO1B1 | |
| SCHEMBL31300108 | 0.97 | CYP3A4 (0.75) | CYP3A4KMT2AMEN1SLCO1B3SLCO1B1 | |
| SCHEMBL721724 | 0.96 | CYP3A4 (0.74) | CYP3A4KMT2AMEN1SLCO1B3SLCO1B1 | |
| SCHEMBL6346047 | 0.96 | CYP3A4 (0.74) | CYP3A4KMT2AMEN1SLCO1B3SLCO1B1 | |
| SCHEMBL5438281 | 0.95 | CYP3A4 (0.80) | CYP3A4KMT2AMEN1SLCO1B3SLCO1B1 | |
| Benzene SCHEMBL23804409 | 0.94 | CYP3A4 (0.71) | CYP3A4KMT2AMEN1SLCO1B3SLCO1B1 | |
| SCHEMBL13360010 | 0.93 | CYP3A4 (0.72) | CYP3A4KMT2AMEN1SLCO1B3SLCO1B1 | |
| SCHEMBL6345514 | 0.92 | CYP3A4 (0.75) | CYP3A4KMT2AMEN1SLCO1B3SLCO1B1 | |
| SCHEMBL5434544 | 0.92 | CYP3A4 (0.75) | CYP3A4KMT2AMEN1SLCO1B3SLCO1B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117964807-A | Solid catalyst component for olefin polymerization, preparation method, catalyst system and application | 中国石油化工股份有限公司 | 2024-05-03 | — | — | CN | claimed |
| CN-117964808-A | Solid catalyst component, preparation method, catalyst system and application | 中国石油化工股份有限公司 | 2024-05-03 | — | — | CN | claimed |
| CN-1222554-C | Resin compound containing functional group derived from benzoquinone-cyclopentadiene adduct and photoresist composition containing the same | CHANGXING CHEMICAL INDUSTRY CO (CN) | 2005-10-12 | — | — | CN | claimed |
| CN-1406990-A | Resin compound containing functional group derived from benzoquinone-cyclopentadiene adduct and photoresist composition containing the same | CHANGXING CHEMICAL INDUSTRY CO (CN) | 2003-04-02 | — | — | CN | claimed |
| CN-117964807-A | Solid catalyst component for olefin polymerization, preparation method, catalyst system and application | 中国石油化工股份有限公司 | 2024-05-03 | — | — | CN | disclosed |
| CN-117964808-A | Solid catalyst component, preparation method, catalyst system and application | 中国石油化工股份有限公司 | 2024-05-03 | — | — | CN | disclosed |
| US-8088564-B2 | Base soluble polymers for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2012-01-03 | — | — | US | disclosed |
| EP-2004725-B1 | BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA (US) | 2009-10-07 | — | — | EP | disclosed |
| US-7550249-B2 | Base soluble polymers for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-06-23 | — | — | US | disclosed |
| US-7537879-B2 | Chemically amplified, sensitive to wavelengths (300 nm - 100 nm); comprises a novel polymer with a sulfone group pendant from a polymer backbone that is insoluble in an aqueous alkaline solution and has acidic moiety protected with acid labile group, and a compound that producing an acid upon irradiation | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-05-26 | — | — | US | disclosed |
| US-20090061347-A1 | BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS | MERCK PATENT GMBH (DE) | 2009-03-05 | — | — | US | disclosed |
| US-7479364-B2 | lithographic photoresist; deep UV, x-ray, electon beam: alpha-cyano- or an alpha-trifluoro methacrylate monomer and a vinyl ether monomer; 157 nm. | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-01-20 | — | — | US | disclosed |
| CN-1222554-C | Resin compound containing functional group derived from benzoquinone-cyclopentadiene adduct and photoresist composition containing the same | CHANGXING CHEMICAL INDUSTRY CO (CN) | 2005-10-12 | — | — | CN | disclosed |
| WO-2005070993-A2 | NORBORNENE-TYPE MONOMERS AND POLYMERS CONTAINING PENDENT LACTONE OR SULTONE GROUPS | PROMERUS LLC (US) | 2005-08-04 | — | — | WO | disclosed |
| US-6800419-B2 | FOR USE AS CHEMICALLY-AMPLIFIED RESIST FOR MICROFABRICATION UTILIZING DEEP ULTRAVIOLET RAYS AND EXHIBITS EXCELLENT FILM THICKNESS UNIFORMITY AND STORAGE STABILITY | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-20040146802-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-29 | — | — | US | disclosed |
| US-20030203307-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |
| CN-1406990-A | Resin compound containing functional group derived from benzoquinone-cyclopentadiene adduct and photoresist composition containing the same | CHANGXING CHEMICAL INDUSTRY CO (CN) | 2003-04-02 | — | — | CN | disclosed |
| US-6509134-B2 | Used to generate resist images; in the manufacture of integrated circuits | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-01-21 | — | — | US | disclosed |
| US-6207779-B1 | PHOTOSENSITIVE | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2001-03-27 | — | — | US | disclosed |