Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | MMP1 | P03956 | 1/20 | 0.33 |
| ▸ | MMP2 | P08253 | 1/20 | 0.33 |
| ▸ | MMP9 | P14780 | 1/20 | 0.33 |
| ▸ | MMP8 | P22894 | 1/20 | 0.33 |
| ▸ | MMP13 | P45452 | 1/20 | 0.33 |
| ▸ | F2 | P00734 | 1/20 | 0.30 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.30 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.30 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8613098 | 1.00 | LMNA (0.40) | LMNATHRBCA2CA1MMP1 | |
| SCHEMBL6899407 | 1.00 | LMNA (0.40) | LMNATHRBCA2CA1MMP1 | |
| SCHEMBL8615317 | 1.00 | LMNA (0.40) | LMNATHRBCA2CA1MMP1 | |
| SCHEMBL8613264 | 1.00 | LMNA (0.40) | LMNATHRBCA2CA1MMP1 | |
| SCHEMBL197971 | 1.00 | LMNA (0.40) | LMNATHRBCA2CA1MMP1 | |
| SCHEMBL6258951 | 1.00 | LMNA (0.40) | LMNATHRBCA2CA1MMP1 | |
| SCHEMBL8090318 | 1.00 | LMNA (0.40) | LMNATHRBCA2CA1MMP1 | |
| SCHEMBL8614288 | 1.00 | LMNA (0.40) | LMNATHRBCA2CA1MMP1 | |
| SCHEMBL345851 | 1.00 | LMNA (0.40) | LMNATHRBCA2CA1MMP1 | |
| SCHEMBL8613060 | 1.00 | LMNA (0.40) | LMNATHRBCA2CA1MMP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 149 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8569087-B2 | Method for manufacturing organic electronic element | KONICA MINOLTA HOLDINGS, INC. (JP) | 2013-10-29 | — | — | US | claimed |
| CN-119161757-A | Anti-fingerprint anti-reflection material, anti-fingerprint anti-reflection film and display device | 广州华睿光电材料有限公司 | 2024-12-20 | — | — | CN | disclosed |
| CN-115038423-B | Curable composition for dental impressions | 登士柏希罗纳有限公司 | 2024-07-19 | — | — | CN | disclosed |
| US-11993728-B2 | Composition for electronic devices, ink for electronic devices, and method for producing electronic device | Konica Minolta, Inc. (JP) | 2024-05-28 | — | — | US | disclosed |
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| CN-117510780-A | Super-hydrophobic self-repairing polysiloxane with high fluorine content and preparation method thereof | 常州大学 | 2024-02-06 | — | — | CN | disclosed |
| CN-116848162-A | Fluorine-containing polymer | 中央硝子株式会社 | 2023-10-03 | — | — | CN | disclosed |
| CN-111788707-B | Composition for electronic device, ink for electronic device, and method for producing electronic device | 柯尼卡美能达株式会社 | 2023-06-20 | — | — | CN | disclosed |
| CN-111656550-B | Light-emitting thin film, light-emitting laminated film, organic electroluminescent element, and method for producing same | 柯尼卡美能达株式会社 | 2023-04-04 | — | — | CN | disclosed |
| US-11539027-B2 | Luminescent thin film, luminescent multilayered film, and organic electroluminescent device, and production method therefor | Konica Minolta, Inc. (JP) | 2022-12-27 | — | — | US | disclosed |
| US-20020051935-A1 | Resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-05-02 | — | — | US | disclosed |
| US-20020051936-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-02 | — | — | US | disclosed |
| US-20020048724-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-25 | — | — | US | disclosed |
| US-20010038969-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. OF (JP) | 2001-11-08 | — | — | US | disclosed |
| US-20010033989-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| US-20010018162-A1 | Novel polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1126322-A2 | Fluorine-containing polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-22 | — | — | EP | disclosed |
| US-6031061-A | Bis (triaklyltrimellitic anhydride) derivative and polyesterimide for optical communications formed therefrom | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-02-29 | — | — | US | disclosed |
| US-5998340-A | Lubricant and magnetic recording medium using the same | HITACHI MAXELL, LTD. (JP) | 1999-12-07 | — | — | US | disclosed |
| EP-0837085-A1 | POLYCARBONATE-BASE POLYMER, PRODUCTION PROCESS, RESIN COATING FLUID PREPARED THEREFROM, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR PREPARED THEREFROM | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1998-04-22 | — | — | EP | disclosed |