Known targets — ChEMBL curated mechanism
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The experimentally established mechanism targets of Sulfosalicylic. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.71 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.71 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.71 |
| ▸ | HPGD | P15428 | 2/20 | 0.71 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 3/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | SERPINE1 | P05121 | 3/20 | 0.40 |
| ▸ | PHLPP2 | Q6ZVD8 | 3/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.37 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.37 |
| ▸ | PRMT1 | Q99873 | 1/20 | 0.37 |
| ▸ | NT5E | P21589 | 2/20 | 0.37 |
| ▸ | NSD2 | O96028 | 1/20 | 0.37 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.37 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfosalicylic SCHEMBL31376377 | 1.00 | ALDH1A1 (0.71) | ALDH1A1HSD17B10KDM4EHPGDLMNA | |
| Sulfosalicylic SCHEMBL30362977 | 0.98 | ALDH1A1 (0.68) | ALDH1A1HSD17B10KDM4EHPGDLMNA | |
| Sulfosalicylic SCHEMBL1503559 | 0.98 | ALDH1A1 (0.68) | ALDH1A1HSD17B10KDM4EHPGDLMNA | |
| Sulfosalicylic SCHEMBL625073 | 0.98 | ALDH1A1 (0.68) | ALDH1A1HSD17B10KDM4EHPGDLMNA | |
| Sulfosalicylic SCHEMBL8592877 | 0.96 | ALDH1A1 (0.66) | ALDH1A1HSD17B10KDM4EHPGDLMNA | |
| Sulfosalicylic SCHEMBL3291090 | 0.94 | ALDH1A1 (0.68) | ALDH1A1HSD17B10KDM4EHPGDLMNA | |
| Sulfosalicylic SCHEMBL28400868 | 0.94 | ALDH1A1 (0.68) | ALDH1A1HSD17B10KDM4EHPGDLMNA | |
| Sulfosalicylic SCHEMBL1503497 | 0.94 | ALDH1A1 (0.68) | ALDH1A1HSD17B10KDM4EHPGDLMNA | |
| Sulfosalicylic SCHEMBL8622539 | 0.94 | ALDH1A1 (0.68) | ALDH1A1HSD17B10KDM4EHPGDLMNA | |
| Sulfosalicylic SCHEMBL6668124 | 0.94 | ALDH1A1 (0.68) | ALDH1A1HSD17B10KDM4EHPGDLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1271561-B1 | Conductive film | FUJIFILM CORP (JP) | 2011-06-22 | — | — | EP | disclosed |
| EP-2251874-A1 | Conductive film | Fujifilm Corporation (JP) | 2010-11-17 | — | — | EP | disclosed |
| EP-1581031-B1 | Methods of forming a pattern and a conductive pattern | FUJIFILM CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-7405035-B2 | Pattern forming method and substance adherence pattern material | FUJIFILM CORPORATION (JP) | 2008-07-29 | — | — | US | disclosed |
| US-7291427-B2 | Surface graft material, conductive pattern material, and production method thereof | FUJIFILM CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| EP-1431821-B1 | Pattern forming method and substance adherence pattern | FUJI PHOTO FILM CO LTD (JP) | 2007-02-14 | — | — | EP | disclosed |
| US-20050214550-A1 | Method of forming a pattern, conductive patterned material, and method of forming a conductive pattern | FUJI PHOTO FILM CO., LTD. | 2005-09-29 | — | — | US | disclosed |
| EP-1581031-A1 | Method of forming a pattern, conductive patterned material, and method of forming a conductive pattern | Fuji Photo Film Co. Ltd. (JP) | 2005-09-28 | — | — | EP | disclosed |
| US-20050208428-A1 | Surface graft material, conductive pattern material, and production method thereof | FUJI PHOTO FILM CO., LTD. | 2005-09-22 | — | — | US | disclosed |
| US-6811878-B2 | MULTILAYER; RADIATION TRANSPARENT SUPPORT, CONDUCTIVE PARTICLES | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-02 | — | — | US | disclosed |
| US-20040126712-A1 | Pattern forming method and substance adherence pattern material | FUJI PHOTO FILM CO., LTD. | 2004-07-01 | — | — | US | disclosed |
| EP-1431821-A1 | Pattern forming method and substance adherence pattern | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-23 | — | — | EP | disclosed |
| US-20030008135-A1 | Conductive film | FUJIFILM CORPORATION (JP) | 2003-01-09 | — | — | US | disclosed |
| EP-1271561-A2 | Conductive film | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-02 | — | — | EP | disclosed |