SCHEMBL19756010

SCHEMBL19756010

O=C(Oc1cccc2c(C(=O)OC(CS(=O)(=O)O)C(F)(F)F)cccc12)c1cc(I)cc(I)c1I

nearest known ligand 0.32

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.32
ESR2 Q92731 4/20 0.32
KMT2A Q03164 2/20 0.32
MEN1 O00255 1/20 0.32
POLB P06746 1/20 0.31
GAA P10253 1/20 0.31
MAPT P10636 1/20 0.30
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19756009 0.94
SCHEMBL19846385 0.86 GABRA1 (0.31)
SCHEMBL19755966 0.85 HDAC3 (0.32)
SCHEMBL19756200 0.82
SCHEMBL19756019 0.81
SCHEMBL19756179 0.80 NPSR1 (0.37) ESR1ESR2KMT2AMEN1POLB
SCHEMBL25844838 0.80 ESR1 (0.32) ESR1ESR2KMT2AMEN1
SCHEMBL19756005 0.80 ALDH1A1 (0.31) KMT2AMAPT
SCHEMBL19846274 0.79 NPSR1 (0.32) KMT2AMEN1
SCHEMBL19756013 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230273519-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD JSR CORPORATION (JP) 2023-08-31 US disclosed
US-20170369616-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-28 US disclosed