SCHEMBL19756170

SCHEMBL19756170

O=C(OC1CCC(C(=O)OCC(F)(F)S(=O)(=O)O)CC1)c1cc(I)cc(I)c1I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21911813 0.83 HDAC3 (0.30) —
SCHEMBL19756174 0.82 — —
SCHEMBL23065534 0.82 HDAC3 (0.33) —
SCHEMBL23843750 0.81 — —
SCHEMBL19756198 0.80 SERPINE1 (0.31) —
SCHEMBL19756007 0.80 — —
SCHEMBL19756177 0.80 — —
SCHEMBL26068000 0.78 POLB (0.31) —
SCHEMBL26343818 0.78 VCP (0.35) —
SCHEMBL19756173 0.77 FGFR1 (0.32) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170369616-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-28 — — US disclosed
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