⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19756188 | 0.84 | — | — | |
| SCHEMBL19678491 | 0.83 | — | — | |
| SCHEMBL19756037 | 0.82 | — | — | |
| SCHEMBL19756184 | 0.82 | — | — | |
| SCHEMBL19756181 | 0.80 | — | — | |
| SCHEMBL22789907 | 0.80 | — | — | |
| SCHEMBL25476384 | 0.79 | — | — | |
| SCHEMBL26807643 | 0.77 | — | — | |
| SCHEMBL19756191 | 0.76 | HDAC3 (0.32) | — | |
| SCHEMBL26312812 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230273519-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2023-08-31 | — | — | US | disclosed |
| US-10613437-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-04-07 | — | — | US | disclosed |
| US-20170369616-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-28 | — | — | US | disclosed |