Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.45 |
| ▸ | ATM | Q13315 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.45 |
| ▸ | MAPT | P10636 | 3/20 | 0.45 |
| ▸ | LMNA | P02545 | 3/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | RECQL | P46063 | 1/20 | 0.39 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.39 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.39 |
| ▸ | CES1 | P23141 | 2/20 | 0.38 |
| ▸ | TARBP2 | Q15633 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methane SCHEMBL20580381 | 0.98 | GAA (0.45) | GAATDP1ATMALDH1A1MAPT | |
| SCHEMBL2376423 | 0.90 | SMN1; SMN2 (0.46) | GAATDP1ATMALDH1A1MAPT | |
| SCHEMBL9738620 | 0.90 | SMN1; SMN2 (0.46) | GAATDP1ATMALDH1A1MAPT | |
| SCHEMBL8093482 | 0.90 | TARBP2 (0.46) | GAAALDH1A1MAPTLMNASMN1; SMN2 | |
| SCHEMBL597720 | 0.89 | TDP1 (0.50) | GAATDP1ATMALDH1A1MAPT | |
| SCHEMBL12443036 | 0.86 | TDP1 (0.51) | GAATDP1ATMALDH1A1MAPT | |
| SCHEMBL4912837 | 0.85 | TDP1 (0.58) | TDP1ATMALDH1A1MAPTLMNA | |
| SCHEMBL27298398 | 0.85 | TDP1 (0.47) | TDP1ATMALDH1A1MAPTLMNA | |
| SCHEMBL3795226 | 0.84 | TDP1 (0.44) | TDP1ATMALDH1A1MAPTLMNA | |
| SCHEMBL4905507 | 0.84 | LMNA (0.62) | GAATDP1ATMALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102016649-A | High refractive index ophthalmic device materials | ALCON INC | 2011-04-13 | — | — | CN | claimed |
| EP-1144542-B1 | POLYMER CEMENT ADDITIVE, CEMENT COMPOSITION AND PROCESS THEREWITH | CONOCOPHILLIPS CO (US) | 2006-07-19 | — | — | EP | claimed |
| EP-1144542-A4 | CEMENT COMPOSITION AND PROCESS THEREWITH | CONOCOPHILLIPS CO (US) | 2004-06-09 | — | — | EP | claimed |
| EP-1144542-A1 | CEMENT COMPOSITION AND PROCESS THEREWITH | Phillips Petroleum Company (US) | 2001-10-17 | — | — | EP | claimed |
| US-6124383-A | CEMENT AND POLYMER ADJUVANT WHICH REDUCES WATER LOSS FROM CEMENT SLURRIES COMPRISING A TETRAPOLYMER OF AN UNSATURATED AMIDE, HYDROXY ACRYLATE, AND TWO MORE SPECIFIED MONOMERS SUCH AS VINYL MORPHOLINE AND A SECOND DIFFERENT UNSATURATED AMIDE | PHILLIPS PETROLEUM COMPANY (US) | 2000-09-26 | — | — | US | claimed |
| WO-2000039244-A1 | CEMENT COMPOSITION AND PROCESS THEREWITH | PHILLIPS PETROLEUM COMPANY (US) | 2000-07-06 | — | — | WO | claimed |
| EP-4430097-B1 | NEUTRAL BRUSHES WITH TUNABLE POLARITY FOR SELF-ASSEMBLY OF BLOCK COPOLYMERS WITH POLY(STYRENE) AND POLY(METHYL METHACRYLATE) CONTAINING SEGMENTS | MERCK PATENT GMBH (DE) | 2026-04-01 | — | — | EP | disclosed |
| US-20250244671-A1 | NEUTRAL BRUSHES WITH TUNABLE POLARITY FOR SELF-ASSEMBLY OF BLOCK COPOLYMERS WITH POLY(STYRENE) AND POLY (METHYL METHACRYLATE) CONTAINING SEGMENTS | EMD PERFORMANCE MATERIALS CORP. | 2025-07-31 | — | — | US | disclosed |
| EP-4430097-A1 | NEUTRAL BRUSHES WITH TUNABLE POLARITY FOR SELF-ASSEMBLY OF BLOCK COPOLYMERS WITH POLY(STYRENE) AND POLY(METHYL METHACRYLATE) CONTAINING SEGMENTS | Merck Patent GmbH (DE) | 2024-09-18 | — | — | EP | disclosed |
| CN-118302461-A | Neutral brush with adjustable polarity for self-assembly with block copolymer containing poly (styrene) and poly (methyl methacrylate) segments | 默克专利股份有限公司 | 2024-07-05 | — | — | CN | disclosed |
| CN-113087843-B | Polymer and photoresist composition containing same | 北京鼎材科技有限公司 | 2023-10-13 | — | — | CN | disclosed |
| WO-2023083933-A1 | NEUTRAL BRUSHES WITH TUNABLE POLARITY FOR SELF-ASSEMBLY OF BLOCK COPOLYMERS WITH POLY(STYRENE) AND POLY(METHYL METHACRYLATE) CONTAINING SEGMENTS | MERCK PATENT GMBH (DE) | 2023-05-19 | — | — | WO | disclosed |
| CN-111033815-B | Composition for functional layer of electrochemical element, functional layer for electrochemical element, and electrochemical element | 日本瑞翁株式会社 | 2023-04-28 | — | — | CN | disclosed |
| CN-1604946-A | Radiation curable compositions for use as optical fiber coatings | PPG IND OHIO INC (US) | 2005-04-06 | — | — | CN | disclosed |
| EP-1144542-A4 | CEMENT COMPOSITION AND PROCESS THEREWITH | CONOCOPHILLIPS CO (US) | 2004-06-09 | — | — | EP | disclosed |
| EP-1144542-A1 | CEMENT COMPOSITION AND PROCESS THEREWITH | Phillips Petroleum Company (US) | 2001-10-17 | — | — | EP | disclosed |
| US-6124383-A | CEMENT AND POLYMER ADJUVANT WHICH REDUCES WATER LOSS FROM CEMENT SLURRIES COMPRISING A TETRAPOLYMER OF AN UNSATURATED AMIDE, HYDROXY ACRYLATE, AND TWO MORE SPECIFIED MONOMERS SUCH AS VINYL MORPHOLINE AND A SECOND DIFFERENT UNSATURATED AMIDE | PHILLIPS PETROLEUM COMPANY (US) | 2000-09-26 | — | — | US | disclosed |
| WO-2000039244-A1 | CEMENT COMPOSITION AND PROCESS THEREWITH | PHILLIPS PETROLEUM COMPANY (US) | 2000-07-06 | — | — | WO | disclosed |
| US-4014842-A | GRAFT POLYMERS | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JA) | 1977-03-29 | — | — | US | disclosed |
| US-3935342-A | POLYMERIZATION WITH AN UNSATURATED SILYL MONOMER | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DT) | 1976-01-27 | — | — | US | disclosed |