SCHEMBL19788667

SCHEMBL19788667

CCN(CC(=O)NC)c1ccc(N)c(C(N)=O)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 8/20 0.43
▸ MEN1 O00255 6/20 0.43
▸ KMT2A Q03164 6/20 0.43
▸ ALDH1A1 P00352 6/20 0.43
▸ HPGD P15428 3/20 0.43
▸ SMN1; SMN2 Q16637 3/20 0.43
▸ ATM Q13315 2/20 0.43
▸ S100B P04271 1/20 0.43
▸ GAA P10253 3/20 0.42
▸ KDM4E B2RXH2 2/20 0.38
▸ GFER P55789 2/20 0.38
▸ GLA P06280 1/20 0.38
▸ IKBKB O14920 1/20 0.38
▸ TSHR P16473 3/20 0.36
▸ ALOX15 P16050 1/20 0.36
▸ HSD17B10 Q99714 1/20 0.36
▸ AOC3 Q16853 1/20 0.36
▸ POLB P06746 1/20 0.35
▸ OXTR P30559 1/20 0.35
▸ AVPR1A P37288 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17774931 0.88 MAPT (0.42) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL17774966 0.87 S100B (0.56) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL17774939 0.83 MAPT (0.43) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL17774952 0.81 S100B (0.46) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL17774929 0.80 S100B (0.45) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL17774935 0.78 IKBKB (0.42) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL25894216 0.77 ALDH1A1 (0.60) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL17774950 0.76 IKBKB (0.44) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL11545057 0.74 S100B (0.56) MAPTMEN1KMT2AALDH1A1HPGD
SCHEMBL17774973 0.73 IKBKB (0.39) MAPTMEN1KMT2AALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9872822-B2 Process for dyeing in the presence of oxidation bases comprising at least one sulfonic, sulfonamide, sulfone, amid or acid group and a metal catalyst, device and ready-to-use composition L'OREAL (FR) 2018-01-23 — — US disclosed
Send feedback