SCHEMBL197919

SCHEMBL197919

C=CCC(=C)C(=O)OCC=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2549360 0.87 CYP3A4 (0.39)
SCHEMBL28162687 0.85 CYP3A4 (0.38)
SCHEMBL15476392 0.80 TSHR (0.38)
SCHEMBL197550 0.80 LMNA (0.32)
Acrylic Acid SCHEMBL6932517 0.80 HSD17B10 (0.39)
SCHEMBL10984608 0.80
SCHEMBL27849189 0.79
Methacrylic Acid SCHEMBL28264161 0.77 TSHR (0.35)
SCHEMBL8570140 0.77
SCHEMBL2358456 0.77 ALDH1A1 (0.45)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2985325-A1 COMPOSITION FOR FORMING FAR-INFRARED RADIATION SHIELDING LAYER Fujifilm Corporation (JP) 2016-02-17 EP disclosed
US-20160033680-A1 COMPOSITION FOR FORMING FAR-INFRARED RADIATION SHIELDING LAYER FUJIFILM CORPORATION (JP) 2016-02-04 US disclosed
US-8088331-B2 Acid liquid leakage sensor ORIGIN ELECTRIC COMPANY, LIMITED (JP) 2012-01-03 US disclosed
EP-1722217-B1 ACID LIQUID LEAK SENSOR ORIGIN ELECTRIC (JP) 2011-04-13 EP disclosed
US-20070275296-A1 Acid Liquid Leakage Sensor ORIGIN ELECTRIC COMPANY, LIMITED (JP) 2007-11-29 US disclosed
EP-1722217-A1 ACID LIQUID LEAK SENSOR Origin Electric Company Ltd (JP) 2006-11-15 EP disclosed