Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 2/20 | 0.57 |
| ▸ | BCHE | P06276 | 1/20 | 0.57 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.55 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.50 |
| ▸ | CA1 | P00915 | 2/20 | 0.50 |
| ▸ | CA2 | P00918 | 2/20 | 0.50 |
| ▸ | CA9 | Q16790 | 2/20 | 0.50 |
| ▸ | IDO1 | P14902 | 2/20 | 0.50 |
| ▸ | CA12 | O43570 | 1/20 | 0.50 |
| ▸ | CA7 | P43166 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.49 |
| ▸ | MEN1 | O00255 | 2/20 | 0.49 |
| ▸ | PKM | P14618 | 1/20 | 0.49 |
| ▸ | RAB9A | P51151 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8052920 | 0.87 | CA2 (0.63) | ACHEBCHECA1CA2CA9 | |
| SCHEMBL6859827 | 0.87 | CA2 (0.63) | ACHEBCHECA1CA2CA9 | |
| SCHEMBL8400160 | 0.86 | MEN1 (0.53) | CYP19A1CA1CA2CA9IDO1 | |
| SCHEMBL4033629 | 0.85 | ACHE (0.55) | ACHEBCHEHSD17B10CA1CA2 | |
| SCHEMBL18007111 | 0.85 | ACHE (0.55) | ACHEBCHEHSD17B10CYP19A1CA1 | |
| SCHEMBL10316917 | 0.85 | ACHE (0.51) | ACHEBCHEHSD17B10CYP19A1CA9 | |
| SCHEMBL27724423 | 0.84 | HTT (0.55) | CYP19A1CA1CA2CA9IDO1 | |
| Dinitrophenylene SCHEMBL27775687 | 0.84 | CYP1A2 (0.55) | ACHEBCHECYP19A1KMT2AALDH1A1 | |
| SCHEMBL2551504 | 0.83 | CYP1A2 (0.61) | ACHEBCHECYP19A1KMT2AMEN1 | |
| SCHEMBL9382983 | 0.83 | ACHE (0.52) | ACHEBCHEHSD17B10KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1088 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| EP-4547763-A2 | TRI-CURE HYBRID ORGANO-SILICON COATINGS | Bowling Green State University (US) | 2025-05-07 | — | — | EP | claimed |
| CN-115368494-B | Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-117757070-A | Polyimide resin capable of being cured at low temperature, photoresist composition and preparation method thereof | 江苏艾森半导体材料股份有限公司 | 2024-03-26 | — | — | CN | claimed |
| WO-2024006254-A2 | TRI-CURE HYBRID ORGANO-SILICON COATINGS | BOWLING GREEN STATE UNIVERSITY (US) | 2024-01-04 | — | — | WO | claimed |
| CN-115685678-A | Star-shaped molecular glass film forming resin and photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2023-02-03 | — | — | CN | claimed |
| CN-115368494-A | Hexafluoroisopropanol-containing monomer copolymer, preparation method thereof, chemical amplification type photoresist and application | 瑞红(苏州)电子化学品股份有限公司 | 2022-11-22 | — | — | CN | claimed |
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | claimed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | claimed |
| US-7253100-B2 | Reducing damage to ulk dielectric during cross-linked polymer removal | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-08-07 | — | — | US | claimed |
| US-20070111466-A1 | REDUCING DAMAGE TO ULK DIELECTRIC DURING CROSS-LINKED POLYMER REMOVAL | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-05-17 | — | — | US | claimed |
| WO-2006055929-A2 | MINIMIZING RESIST POISONING IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES | TEXAS INSTRUMENTS INCORPORATED (US) | 2006-05-26 | — | — | WO | claimed |
| US-20060110901-A1 | Minimizing resist poisoning in the manufacture of semiconductor devices | TEXAS INSTRUMENTS, INC. (US) | 2006-05-25 | — | — | US | claimed |
| US-7030031-B2 | Method for forming damascene structure utilizing planarizing material coupled with diffusion barrier material | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-04-18 | — | — | US | claimed |
| US-20050079701-A1 | METHOD FOR FORMING DAMASCENE STRUCTURE UTILIZING PLANARIZING MATERIAL COUPLED WITH COMPRESSIVE DIFFUSION BARRIER MATERIAL | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-04-14 | — | — | US | claimed |
| CN-1574234-A | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2005-02-02 | — | — | CN | claimed |
| US-20040266201-A1 | METHOD FOR FORMING DAMASCENE STRUCTURE UTILIZING PLANARIZING MATERIAL COUPLED WITH DIFFUSION BARRIER MATERIAL | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2004-12-30 | — | — | US | claimed |
| US-20040253547-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-12-16 | — | — | US | claimed |
| US-5916728-A | RESIN WHICH IS CONVERTED TO ALKALI-SOLUBLE FROM ALKALI-INSOLUBLE OR ALKALI-SLIGHTLY SOLUBLE BY THE ACTION OF AN ACID, ACID GENERATOR AND TERTIARY AMINE COMPOUND HAVING AN ALIPHATIC HYDROXYL GROUP. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-06-29 | — | — | US | claimed |