SCHEMBL19806848

SCHEMBL19806848

CC(c1ccc(-c2ccccc2)cc1)(c1cccc2ccc(O)cc12)c1c(O)ccc2ccc(O)cc12

nearest known ligand 0.42

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 7/20 0.42
▸ ESR2 Q92731 7/20 0.42
▸ HSD17B2 P37059 6/20 0.41
▸ HSD17B1 P14061 5/20 0.41
▸ CYP1A2 P05177 2/20 0.41
▸ CYP3A4 P08684 2/20 0.41
▸ CYP2D6 P10635 2/20 0.41
▸ CYP2C9 P11712 2/20 0.41
▸ CYP2B6 P20813 2/20 0.41
▸ CYP2C19 P33261 2/20 0.41
▸ CDK4 P11802 3/20 0.39
▸ CCND1 P24385 3/20 0.39
▸ MCL1 Q07820 1/20 0.37
▸ TRPV1 Q8NER1 1/20 0.36
▸ TLR8 Q9NR97 1/20 0.35
▸ PTPRC P08575 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23082042 0.90 ESR1 (0.48) ESR1ESR2HSD17B2HSD17B1CYP1A2
SCHEMBL19803933 0.90 ESR1 (0.45) ESR1ESR2HSD17B2HSD17B1CYP1A2
SCHEMBL19806908 0.89 ESR1 (0.47) ESR1ESR2HSD17B2HSD17B1CYP1A2
SCHEMBL19806874 0.87 ESR1 (0.38) ESR1ESR2HSD17B2HSD17B1CYP1A2
SCHEMBL23861411 0.84 ESR1 (0.41) ESR1ESR2HSD17B2HSD17B1CYP1A2
SCHEMBL23861444 0.81 ESR1 (0.50) ESR1ESR2HSD17B2HSD17B1CYP1A2
SCHEMBL23082053 0.81 ESR1 (0.54) ESR1ESR2HSD17B2HSD17B1CYP1A2
SCHEMBL19803934 0.80 ESR1 (0.42) ESR1ESR2HSD17B2CYP1A2CYP2D6
SCHEMBL23861567 0.80 ESR1 (0.41) ESR1ESR2HSD17B2CYP3A4CYP2C9
SCHEMBL23861487 0.78 CYP1A2 (0.46) ESR1ESR2HSD17B2HSD17B1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2018016640-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD 三菱瓦斯化学株式会社 2018-01-25 — — WO disclosed
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