SCHEMBL19806874

SCHEMBL19806874

CC(c1ccc(-c2ccccc2)cc1)(c1cccc2ccccc12)c1c(O)ccc2ccccc12

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 3/20 0.38
▸ ESR2 Q92731 3/20 0.38
▸ HSD17B2 P37059 2/20 0.37
▸ PTPN22 Q9Y2R2 1/20 0.37
▸ POLB P06746 2/20 0.36
▸ MEN1 O00255 1/20 0.36
▸ GAA P10253 1/20 0.36
▸ KMT2A Q03164 1/20 0.36
▸ CYP1A2 P05177 4/20 0.36
▸ CYP2C9 P11712 4/20 0.36
▸ CYP2C19 P33261 3/20 0.36
▸ CYP2D6 P10635 2/20 0.36
▸ HPGD P15428 2/20 0.36
▸ HSD17B10 Q99714 2/20 0.36
▸ THRB P10828 1/20 0.36
▸ HIF1A Q16665 1/20 0.36
▸ CYP3A4 P08684 1/20 0.36
▸ HSD17B1 P14061 1/20 0.36
▸ CYP2B6 P20813 1/20 0.36
▸ MCL1 Q07820 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19803933 0.92 ESR1 (0.45) ESR1ESR2HSD17B2CYP1A2CYP2C9
SCHEMBL19803934 0.90 ESR1 (0.42) ESR1ESR2HSD17B2PTPN22POLB
SCHEMBL19806908 0.89 ESR1 (0.47) ESR1ESR2HSD17B2CYP1A2CYP2C9
SCHEMBL19806848 0.87 ESR1 (0.42) ESR1ESR2HSD17B2CYP1A2CYP2C9
SCHEMBL23861559 0.87 PTPN22 (0.44) ESR1ESR2HSD17B2PTPN22POLB
SCHEMBL23861563 0.82 PTPN22 (0.48) ESR1ESR2HSD17B2PTPN22POLB
SCHEMBL23861443 0.81 ESR1 (0.47) ESR1ESR2HSD17B2PTPN22POLB
SCHEMBL23082042 0.78 ESR1 (0.48) ESR1ESR2HSD17B2POLBGAA
SCHEMBL23082053 0.77 ESR1 (0.54) ESR1ESR2HSD17B2CYP1A2CYP2C9
SCHEMBL29465780 0.75 ESR1 (0.55) ESR1ESR2MEN1GAAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2018016640-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD 三菱瓦斯化学株式会社 2018-01-25 — — WO disclosed
Send feedback