Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 3/20 | 0.42 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.42 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.42 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.41 |
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | GAA | P10253 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.39 |
| ▸ | USP2 | O75604 | 1/20 | 0.39 |
| ▸ | PAK1 | Q13153 | 1/20 | 0.39 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.37 |
| ▸ | HPGD | P15428 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | GLA | P06280 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23861559 | 0.97 | PTPN22 (0.44) | ESR1ESR2PTPN22HSD17B2THRB | |
| SCHEMBL23861563 | 0.92 | PTPN22 (0.48) | ESR1ESR2PTPN22HSD17B2THRB | |
| SCHEMBL23861443 | 0.90 | ESR1 (0.47) | ESR1ESR2PTPN22HSD17B2THRB | |
| SCHEMBL19806874 | 0.90 | ESR1 (0.38) | ESR1ESR2PTPN22HSD17B2THRB | |
| SCHEMBL23082042 | 0.87 | ESR1 (0.48) | ESR1ESR2HSD17B2POLBGAA | |
| SCHEMBL23082053 | 0.85 | ESR1 (0.54) | ESR1ESR2HSD17B2CYP1A2CYP2C9 | |
| SCHEMBL19803933 | 0.83 | ESR1 (0.45) | ESR1ESR2HSD17B2CYP1A2CYP2C9 | |
| SCHEMBL23861638 | 0.83 | POLB (0.44) | ESR1ESR2PTPN22HSD17B2THRB | |
| SCHEMBL19806848 | 0.80 | ESR1 (0.42) | ESR1ESR2HSD17B2CYP1A2CYP2C9 | |
| SCHEMBL23861411 | 0.79 | ESR1 (0.41) | ESR1ESR2HSD17B2HSD17B10CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11130724-B2 | Compound, resin, composition, resist pattern formation method, and circuit pattern formation method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-09-28 | — | — | US | disclosed |
| US-20210070727-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-11 | — | — | US | disclosed |
| US-20210070683-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-11 | — | — | US | disclosed |
| US-20210070685-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-11 | — | — | US | disclosed |
| US-10723690-B2 | (Meth)acryloyl compound and method for producing same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-07-28 | — | — | US | disclosed |
| US-20180210341-A1 | NOVEL (METH)ACRYLOYL COMPOUND AND METHOD FOR PRODUCING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-07-26 | — | — | US | disclosed |
| US-20180210341-A1 | NOVEL (METH)ACRYLOYL COMPOUND AND METHOD FOR PRODUCING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-07-26 | — | — | US | disclosed |
| EP-3326997-A1 | NEW (METH)ACRYLOYL COMPOUND AND PRODUCTION METHOD FOR SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-05-30 | — | — | EP | disclosed |
| WO-2018016615-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | 三菱瓦斯化学株式会社 | 2018-01-25 | — | — | WO | disclosed |
| WO-2018016640-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | 三菱瓦斯化学株式会社 | 2018-01-25 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210070683-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | RER1, RTN4, FEM1B | ESR1 1539/4885ESR2 2068/4885PTPN22 3135/4885 |
| US-20180210341-A1 | NOVEL (METH)ACRYLOYL COMPOUND AND METHOD FOR PRODUCING SAME | MTR, MRM1, MT-CO1 | ESR1 2134/4885ESR2 2091/4885PTPN22 2283/4885 |
| US-20210070727-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | RDX, RTN4, CROCC | ESR1 1453/4885ESR2 1492/4885PTPN22 4544/4885 |
| US-10723690-B2 | (Meth)acryloyl compound and method for producing same | MTR, MRM1, MT-CO1 | ESR1 2071/4885ESR2 2182/4885PTPN22 2048/4885 |
| US-20210070685-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | RER1, RTN4, FEM1B | ESR1 1539/4885ESR2 2068/4885PTPN22 3135/4885 |
| US-11130724-B2 | Compound, resin, composition, resist pattern formation method, and circuit pattern formation method | RER1, NBAS, INTS9 | ESR1 713/4885ESR2 1033/4885PTPN22 2079/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.