Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | MAOB | P27338 | 4/20 | 0.38 |
| ▸ | CA4 | P22748 | 1/20 | 0.38 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 3/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.34 |
| ▸ | MITF | O75030 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | GFER | P55789 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.34 |
| ▸ | NOD2 | Q9HC29 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28017927 | 0.89 | LTA4H (0.50) | LTA4HTSHRMAOBCA4KCNA3 | |
| SCHEMBL13289 | 0.89 | LTA4H (0.50) | LTA4HTSHRMAOBCA4KCNA3 | |
| SCHEMBL27823142 | 0.86 | LTA4H (0.43) | LTA4HTSHRMAOBCA4KCNA3 | |
| SCHEMBL17807541 | 0.86 | MAOA (0.41) | LTA4HALDH1A1 | |
| Bromide SCHEMBL661543 | 0.86 | LTA4H (0.47) | LTA4HTSHRMAOBCA4KCNA3 | |
| SCHEMBL11679017 | 0.86 | LTA4H (0.47) | LTA4HTSHRMAOBCA4KCNA3 | |
| SCHEMBL19327377 | 0.86 | LTA4H (0.47) | LTA4HTSHRMAOBCA4KCNA3 | |
| Hydrochloric Acid SCHEMBL3848860 | 0.86 | LTA4H (0.47) | LTA4HTSHRCA4KCNA3MEN1 | |
| SCHEMBL11681119 | 0.86 | LTA4H (0.47) | LTA4HTSHRCA4KCNA3KMT2A | |
| SCHEMBL8662152 | 0.86 | LTA4H (0.47) | LTA4HTSHRCA4KCNA3KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5548007-A | Radiation-resistant polypropylene resin composition | MITSUI TOATSU CHEMICALS, INC. (JP) | 1996-08-20 | — | — | US | claimed |
| US-5548008-A | SYNDIOTACTIC; CONTAINS AT LEAST ONE ADDITIVE FROM PHOSPHORUS-OR AMINE-CONTAINING ANTIOXIDANTS AND A NUCLEATING AGENT | MITSUI TOATSU CHEMICALS, INC. (JP) | 1996-08-20 | — | — | US | claimed |
| WO-2024095995-A1 | ESTER-COMPOUND-CONTAINING COMPOSITION AND METHOD FOR PRODUCING SAME, POLYMERIZABLE COMPOSITION, AND (METH)ACRYLIC POLYMER AND METHOD FOR PRODUCING SAME | 三菱ケミカル株式会社 | 2024-05-10 | — | — | WO | disclosed |
| WO-2024095957-A1 | ESTER COMPOUND-CONTAINING COMPOSITION, METHOD FOR PRODUCING SAME, POLYMERIZABLE COMPOSITION, (METH)ACRYLIC POLYMER, AND METHOD FOR PRODUCING SAME | 三菱ケミカル株式会社 | 2024-05-10 | — | — | WO | disclosed |
| WO-2024090576-A1 | MONOMER COMPOSITION, METHACRYLIC RESIN COMPOSITION AND PRODUCTION METHOD THEREFOR, AND MOLDED RESIN OBJECT | 三菱ケミカル株式会社 | 2024-05-02 | — | — | WO | disclosed |
| WO-2024090544-A1 | METHACRYLATE-CONTAINING COMPOSITION, METHOD FOR PRODUCING METHACRYLIC ESTER, POLYMERIZABLE COMPOSITION, AND METHOD FOR PRODUCING METHACRYLIC ACID POLYMER | 三菱ケミカル株式会社 | 2024-05-02 | — | — | WO | disclosed |
| US-20240124685-A1 | Methyl Methacrylate-Containing Composition, Storage Method for Methyl Methacrylate-Containing Composition, and Production Method for Methyl Methacrylate Polymer | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-04-18 | — | — | US | disclosed |
| WO-2024063093-A1 | ESTER-COMPOUND-CONTAINING COMPOSITION AND METHOD FOR PRODUCING SAME, METHODS FOR PRODUCING POLYMERIZABLE COMPOSITION AND (METH)ACRYLIC POLYMER | 三菱ケミカル株式会社 | 2024-03-28 | — | — | WO | disclosed |
| US-20240085784-A1 | ORGANIC EL DISPLAY DEVICE | TOYO INK SC HOLDINGS CO., LTD. (JP) | 2024-03-14 | — | — | US | disclosed |
| EP-4332080-A1 | METHYL METHACRYLATE-CONTAINING COMPOSITION | Mitsubishi Chemical Corporation (JP) | 2024-03-06 | — | — | EP | disclosed |
| EP-4332130-A1 | METHYL METHACRYLATE-CONTAINING COMPOSITION AND METHOD FOR PRODUCING METHYL METHACRYLATE POLYMER | Mitsubishi Chemical Corporation (JP) | 2024-03-06 | — | — | EP | disclosed |
| EP-0850916-B1 | Color-stabilized basic monomers, process for producing the same | NIPPON CATALYTIC CHEM IND (JP) | 2001-09-05 | — | — | EP | disclosed |
| EP-1123915-A1 | Process for producing alpha, beta-unsaturated carboxylic acid esters and catalyst for use in such process | Nippon Shokubai Co., Ltd. (JP) | 2001-08-16 | — | — | EP | disclosed |
| US-5912384-A | DIALKYLAMINOALKYL (METH)ACRYLATE OR (METH)ACRYLAMIDE MONOMERS WITH AMIDE, PHOSPHOROUS ESTER, PHOSPHORIC ESTER, PHOSPHINE AND A PHENOL COMPOUND | NIPPON SHOKUBAI CO., LTD. (JP) | 1999-06-15 | — | — | US | disclosed |
| EP-0850916-A1 | Color-stabilized basic monomers, process for producing the same | NIPPON SHOKUBAI CO., LTD. (JP) | 1998-07-01 | — | — | EP | disclosed |
| US-5548008-A | SYNDIOTACTIC; CONTAINS AT LEAST ONE ADDITIVE FROM PHOSPHORUS-OR AMINE-CONTAINING ANTIOXIDANTS AND A NUCLEATING AGENT | MITSUI TOATSU CHEMICALS, INC. (JP) | 1996-08-20 | — | — | US | disclosed |
| US-5548007-A | Radiation-resistant polypropylene resin composition | MITSUI TOATSU CHEMICALS, INC. (JP) | 1996-08-20 | — | — | US | disclosed |
| EP-0431475-B1 | Radiation-resistant polypropylene resin composition | MITSUI TOATSU CHEMICALS (JP) | 1995-03-15 | — | — | EP | disclosed |
| US-5340848-A | Radiation-resistant polypropylene resin composition | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1994-08-23 | — | — | US | disclosed |
| EP-0431475-A2 | Radiation-resistant polypropylene resin composition | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1991-06-12 | — | — | EP | disclosed |