SCHEMBL19846331

SCHEMBL19846331

O=C(OCCS(=O)(=O)O)C1CCC(C(=O)Oc2c(I)cc(I)cc2I)CC1

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ HTT P42858 1/20 0.32
▸ PKM P14618 2/20 0.31
▸ KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19846340 0.92 — —
SCHEMBL19846335 0.85 TP53 (0.32) —
SCHEMBL18775925 0.78 KMT2A (0.33) PKMKMT2A
SCHEMBL21911813 0.78 HDAC3 (0.30) —
SCHEMBL25476559 0.77 HTT (0.32) HTTPKMKMT2A
SCHEMBL19678501 0.76 ELANE (0.37) HTTKMT2A
SCHEMBL19846377 0.76 ACP1 (0.32) —
SCHEMBL19846323 0.76 ACP1 (0.35) —
SCHEMBL19846350 0.75 LMNA (0.35) PKMKMT2A
SCHEMBL25737137 0.75 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230273519-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD JSR CORPORATION (JP) 2023-08-31 — — US disclosed
US-20180039173-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-02-08 — — US disclosed
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