⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14838468 | 0.88 | MMP8 (0.33) | — | |
| SCHEMBL10248263 | 0.88 | MMP8 (0.33) | — | |
| SCHEMBL13759975 | 0.87 | MMP8 (0.33) | — | |
| SCHEMBL18698633 | 0.87 | MMP8 (0.33) | — | |
| SCHEMBL12296066 | 0.83 | — | — | |
| SCHEMBL15203370 | 0.82 | — | — | |
| SCHEMBL12067125 | 0.82 | TSHR (0.30) | — | |
| SCHEMBL18670941 | 0.82 | — | — | |
| SCHEMBL20804289 | 0.79 | — | — | |
| SCHEMBL22111755 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10562991-B2 | Developer, pattern forming method, and electronic device manufacturing method | FUJIFILM CORPORATION (JP) | 2020-02-18 | — | — | US | disclosed |
| US-20180186907-A1 | DEVELOPER, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | FUJIFILM CORPORATION (JP) | 2018-07-05 | — | — | US | disclosed |
| US-9904167-B2 | Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |