⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23015549 | 0.86 | — | — | |
| SCHEMBL23015550 | 0.86 | CYP19A1 (0.33) | — | |
| SCHEMBL23015556 | 0.83 | EPHX1 (0.32) | — | |
| SCHEMBL19901935 | 0.83 | MMP1 (0.30) | — | |
| SCHEMBL12460124 | 0.80 | CYP19A1 (0.42) | — | |
| SCHEMBL15945472 | 0.79 | HMGCR (0.34) | — | |
| SCHEMBL26939734 | 0.77 | CYP19A1 (0.32) | — | |
| SCHEMBL19901932 | 0.76 | CYP19A1 (0.31) | — | |
| SCHEMBL19558204 | 0.76 | MAPT (0.33) | — | |
| SCHEMBL26939723 | 0.76 | CYP19A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9904168-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |