SCHEMBL19901957

SCHEMBL19901957

COCc1cc(C2(c3cc(COC)c(OC(=O)OC)c(COC)c3)CCC(c3cc(COC)c(OC(=O)OC)c(COC)c3)(c3cc(COC)c(OC(=O)OC)c(COC)c3)CC2)cc(COC)c1OC(=O)OC

nearest known ligand 0.33

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.33
GAA P10253 2/20 0.33
MAPK1 P28482 1/20 0.33
PRKCE Q02156 2/20 0.33
CHRNA7 P36544 1/20 0.32
HTR3A P46098 1/20 0.32
MEN1 O00255 2/20 0.32
ALDH1A1 P00352 2/20 0.32
KMT2A Q03164 2/20 0.32
TDP1 Q9NUW8 2/20 0.31
POLB P06746 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
PRKCG P05129 1/20 0.30
PRKCA P17252 1/20 0.30
APEX1 P27695 1/20 0.30
RECQL P46063 1/20 0.30
MYLK Q15746 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18195486 0.94 POLB (0.33) MAPTGAAMAPK1PRKCECHRNA7
SCHEMBL18197621 0.91
SCHEMBL14081746 0.71 PRKCE (0.43) MAPTGAAMAPK1PRKCEMEN1
SCHEMBL19680382 0.69 ACHE (0.55) MAPTPRKCEMEN1ALDH1A1KMT2A
SCHEMBL10076747 0.68 ACHE (0.58) MAPTPRKCEMEN1ALDH1A1KMT2A
SCHEMBL18102207 0.67 ACHE (0.34)
SCHEMBL18101023 0.67 ACHE (0.47) MAPTPRKCEMEN1ALDH1A1KMT2A
SCHEMBL9999654 0.66 ESR1 (0.30)
SCHEMBL18101022 0.65 ACHE (0.67) MAPTMAPK1PRKCEMEN1ALDH1A1
SCHEMBL20110099 0.65 ACHE (0.67) MAPTMAPK1PRKCEMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9904168-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2018-02-27 US disclosed