SCHEMBL20110099

SCHEMBL20110099

COCc1cc(C2(c3cc(C)c(O)c(COC)c3)CCCCCCCCC2)cc(C)c1O

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.67
ESR1 P03372 4/20 0.49
ESR2 Q92731 4/20 0.49
ALOX12 P18054 4/20 0.41
LMNA P02545 3/20 0.41
ALDH1A1 P00352 3/20 0.41
PPARA Q07869 1/20 0.39
PRKCE Q02156 3/20 0.38
MYLK Q15746 2/20 0.38
MAPT P10636 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
MEN1 O00255 1/20 0.38
PRKCG P05129 1/20 0.38
PRKCA P17252 1/20 0.38
APEX1 P27695 1/20 0.38
RECQL P46063 1/20 0.38
KMT2A Q03164 1/20 0.38
NPSR1 Q6W5P4 1/20 0.37
L3MBTL1 Q9Y468 2/20 0.33
KDM4E B2RXH2 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18101022 1.00 ACHE (0.67) ACHEESR1ESR2ALOX12LMNA
SCHEMBL10076747 0.92 ACHE (0.58) ACHEESR1ESR2ALOX12LMNA
SCHEMBL18100881 0.91 ACHE (0.55) ACHEESR1ESR2ALOX12LMNA
SCHEMBL18101024 0.91 ACHE (0.55) ACHEESR1ESR2ALOX12LMNA
SCHEMBL19680382 0.90 ACHE (0.55) ACHEESR1ESR2ALOX12LMNA
SCHEMBL18101023 0.86 ACHE (0.47) ACHEESR1ESR2ALOX12LMNA
SCHEMBL18101025 0.84 ACHE (0.46) ACHEESR1ESR2ALOX12LMNA
SCHEMBL8346849 0.84 ACHE (0.71) ACHEESR1ESR2ALOX12LMNA
SCHEMBL20225253 0.84 ACHE (0.71) ACHEESR1ESR2ALOX12LMNA
SCHEMBL20102181 0.84 ACHE (0.71) ACHEESR1ESR2ALOX12LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10928727-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing FUJIFILM CORPORATION (JP) 2021-02-23 US disclosed
US-20180120701-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed