Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15930944 | 0.88 | ALDH1A1 (0.32) | ALDH1A1L3MBTL1ATM | |
| SCHEMBL107260 | 0.86 | ATM (0.45) | ALDH1A1L3MBTL1ATM | |
| SCHEMBL20349660 | 0.86 | — | — | |
| SCHEMBL22725059 | 0.85 | ALDH1A1 (0.31) | ALDH1A1L3MBTL1ATM | |
| SCHEMBL20821287 | 0.83 | — | — | |
| SCHEMBL24409155 | 0.83 | HSD11B1 (0.33) | — | |
| SCHEMBL107298 | 0.81 | HSD11B1 (0.40) | ALDH1A1L3MBTL1 | |
| SCHEMBL21731852 | 0.75 | GRIN1 (0.31) | ALDH1A1L3MBTL1ATM | |
| SCHEMBL13225195 | 0.75 | ALDH1A1 (0.40) | ALDH1A1L3MBTL1 | |
| SCHEMBL24581533 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210371376-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-12-02 | — | — | US | disclosed |
| US-10599038-B2 | Rinsing liquid, pattern forming method, and electronic device manufacturing method | FUJIFILM CORPORATION (JP) | 2020-03-24 | — | — | US | disclosed |
| US-9904168-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210371376-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-10, H1-0, OXSR1 | ALDH1A1 750/4885L3MBTL1 2117/4885ATM 2073/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.